Apparatus for reflecting an incident ray of electromagnetic radiation

ABSTRACT

A flow through photochemistry apparatus and methods of use are disclosed in the present application. One or more reactant materials are passed through a reaction chamber and are exposed to electromagnetic radiation. The reaction chamber has reflective walls arranged to reflect electromagnetic radiation across the volume of the chamber a plurality of times, thereby increasing the probability of the electromagnetic radiation interacting with the reactive materials. The reaction chamber may be used for sterilization and photochemistry applications.

This application relates in general to an apparatus or method forreflecting an incident ray of electromagnetic radiation which can beused in many different embodiments as disclosed in detail hereinafter.

For example, a flow through photochemistry apparatus and methods of useare disclosed in the present application. One or more reactant materialsare passed through a reaction chamber and are exposed to electromagneticradiation.

The reaction chamber may have reflective walls or mirrors arranged toreflect electromagnetic radiation across the volume of the chamber aplurality of times, thereby increasing the probability of theelectromagnetic radiation interacting with the reactive materials. Thereaction chamber may be used for sterilization and photochemistryapplications.

The reflecting system can however be used in many other locations wherehigh efficiency reflection is required.

BACKGROUND OF THE INVENTION

The pandemic spread of the SARS-CoV-2 virus has created an urgent needfor means to limit the airborne transmission of infectious particles.Ultraviolet (UV) radiation is known to deactivate virus particles, butwidespread use of UV technologies is limited by the high cost of UVsources and the relatively long exposure times required. Long exposuretimes are required because prior art devices make inefficient use of UVphotons. In the simplest arrangement, a UV source is positionedproximate to a sample material to be irradiated, a portion of the photonflux impinges on the sample, and a fraction of the impinging fluxinteracts with the sample. The remainder of the photon flux is absorbedby the apparatus. That is each UV photon generated has only a smallprobability of interacting with the sample material. Prior art systemsfall into three classes. In the first class metallic walls are providedthat reflect photon flux specularly causing a portion of the photon fluxto pass through the sample material a plurality of times. Aluminum isknown to be an excellent metallic reflector in the UV region, but thereflectivity depends on angle of incidence and polarization averagingabout 90%. The sum of intensity for an infinite number of reflections isgiven by 1/(R−1) setting a theoretical limit to 10-fold amplificationfor this class. In the second class, a diffuse reflector such assintered PTFE is used. The reflectivity is about 97% giving atheoretical limit of 33-fold amplification. The effective amplificationis less however because with a Lambertian distribution of reflectedangles, the mean free photon path length between successive diffusereflectance sites is short. The third class is based on total internalreflection within a liquid wherein there is no absorption loss forangles of incidence above a critical angle. The performance of thisclass is limited to the extent that light is scattered into angles lessthan the critical angle.

Photochemical reactions have applications ranging from the synthesis ofspecialty products to neutralizing pollutants. The range of commerciallyviable applications is limited by energy cost.

SUMMARY OF THE INVENTION

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for applying electromagnetic radiation to reactant materials in areaction chamber comprising:

introducing the electromagnetic radiation into the chamber;

and increasing the probability of interaction of the electromagneticradiation with the reactant materials by using multiple reflections toincrease the optical path length of the electromagnetic radiationthrough the reaction chamber;

wherein the reaction chamber includes two opposing reflective surfacesof the chamber arranged to cause reflections of the electromagneticradiation back and forth within a volume between the reflectivesurfaces;

wherein at least one of the reflective surfaces is a concave mirror.

According to one optional feature of the invention which can be usedwith any of the other features defined herein at least one reflectivesurface of the reaction chamber comprises a dielectric mirror withreflectivity at the selected wavelengths greater than 99%.

According to one optional feature of the invention which can be usedwith any of the other features defined herein a majority of radiationpaths include at least ten and preferably more than one hundredreflections.

According to one optional feature of the invention which can be usedwith any of the other features defined herein there is provided afurther reflective surface between the two reflective surfaces or thepath may be a straight line path with no reflections or deviations. Thefurther reflective surface may for example be a reaction chamber sidewall oriented substantially perpendicular to the optical axis betweenthe two reflective surfaces.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the further reflectivemirror surface is metallic.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the reflective surfacesdefine at least one center optical axis extending therebetween alongwhich the reflections pass and the source is preferably located at aposition offset from the center axis between the reflective surfaces sothat a locus of the reflections moves toward the center axis.

The source can be any one of many known arrangements for generating andemitting the required electromagnetic radiation or photons. The term“source” can relate to the actual component generating the radiation. Orthe generating component can be located at a different or remotelocation and the radiation carried to the required emission location bya transmission device such as a light pipe. In this case the source canbe considered as the exit point of the transmission device. Such lightpipes can be rigid and typically straight or can be flexible such as afiber optic to carry the radiation along a convoluted path. Theradiation can also form a beam which is redirected by any redirectingcomponent such as a prism or a mirror so as to be directed along therequired path. The redirecting components can be located at the surfaceof the chamber so as in effect to form an orifice, or may be internal tothe chamber.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the source is located atone side of said at least one concave mirror.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the source is located at aposition on said at least one concave mirror. The source may have adimension which is less than 0.03 times the focal length of the mirror.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the offset between eachbeam and a next beam after a reflection is less than a width of the beamso that the beams form a complete curtain.

According to one optional feature of the invention which can be usedwith any of the other features defined herein there is provided an inletport for admitting reactive materials and an outlet port for dischargingproduct materials and there is provided absorbing surfaces formed andshaped to stop transmission of electromagnetic radiation from theinterior of the chamber to an exterior location. Preferably the inletand outlet ports are not on an axis of symmetry of the reaction chamber.

According to one optional feature of the invention which can be usedwith any of the other features defined herein at least part of a chamberwall reflects electromagnetic radiation diffusely.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the method includes usinga further electromagnetic radiation to obtain information relating tothe reactant materials where the further electromagnetic radiation has afurther wavelength different from said wavelength at which thedielectric mirror reflects the electromagnetic radiation at thewavelength at a second lower percentage.

According to one optional feature of the invention which can be usedwith any of the other features defined herein a volume accessible toreactive material flowing through the reaction chamber is constrained bya transparent material to less than the volume accessible toelectromagnetic radiation within the reaction chamber.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the reactive material isentrained in a fluid flow wherein the fluid is a liquid or a gas.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided anelectric field is generated in the reaction chamber and said electricfield enhances absorption of electromagnetic radiation by said reactantmaterials. Preferably the electric field is operable to orient moleculeswithin reactive materials relative to the polarization of the EMradiation field at a location in the reaction chamber.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the electromagneticradiation is UVC radiation and the reactive material is a microorganismselected from the list of bacteria, virus, protozoan, helminth, yeast,mould or fungus and said UVC radiation inactivates said microorganism.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the electromagneticradiation is at least partially collimated to travel primarily back andforth between the reflective surfaces.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the surfaces can be ofdifferent shapes and diameters to match the profile of a contained intowhich they are inserted. Thus for example in a water container or bottlea larger end may have a larger surface and an opposed end be smallerAccording to one optional feature of the invention which can be usedwith any of the other features defined herein, when used with liquid,for example for sterilizing water, the chamber can be arranged so thatit is fully filled by gravity by the entering liquid so as to avoidliquid surfaces within the chamber which can interfere with theradiation paths and cause unsuitable or less efficient reflections.

According to one optional feature of the invention which can be usedwith any of the other features defined herein, the source can be aradiant cylindrical tube located within the chamber preferably at anorientation parallel to the optical axis but optionally at otherorientations such as right angle to the axis. If parallel to the axis,the tube can be located on the axis or spaced outwardly from the axis.The preferred or optimum position locates the tube at a spacing from theaxis of one half of the radius of the concave surface.

According to one optional feature of the invention which can be usedwith any of the other features defined herein, the concave mirror can beformed with a central section at the axis which is a dielectric mirrorand on outer ring of a material of reduced reflectivity such as polishedaluminum.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for applying electromagnetic radiation to reactant materials in areaction chamber comprising:

introducing the electromagnetic radiation into the chamber;

and increasing the probability of interaction of the electromagneticradiation with the reactant materials by using multiple reflections toincrease the optical path length of the electromagnetic radiationthrough the reaction chamber;

wherein a source of at least some of the electromagnetic radiation isexternal to the reaction chamber and the electromagnetic radiation froma radiation emitting area of said source is introduced into the reactionchamber from said source through an orifice.

In this arrangement, preferably the radiation from said emitting area isdirected such that substantially all passes through the orifice.

In this arrangement, preferably the orifice is of a smaller area than abody of the source.

In this arrangement, the orifice can comprise an aperture oralternatively the orifice comprises a light pipe. The term light pipe isintended to include any light transmission system where light is carriedfrom a source to a required located. Such light pipes can be rigid orflexible.

In this arrangement, preferably the orifice is sized and positioned toreduce an amount of electromagnetic radiation incident thereon andexiting the reaction chamber through the orifice and being re-absorbedby the source. Thus the orifice can emit the radiation into a firstsolid angle entering the chamber, but restrict the exit of the light inview of the small transverse dimension and hence small second solidangle the orifice presents to radiation reflected from points within thechamber. Thus the orifice, or the source itself where there is noorifice, is preferably offset from the optical axis as defined herein sothat the probability of light returning to the orifice is reduced toagain reduce the proportion of injected radiation from exiting at thesource or the orifice.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for applying electromagnetic radiation to reactant materials in areaction chamber comprising:

introducing the electromagnetic radiation into the chamber;

and increasing the probability of interaction of the electromagneticradiation with the reactant materials by using multiple reflections toincrease the optical path length of the electromagnetic radiationthrough the reaction chamber;

wherein the electromagnetic radiation is at least partially collimated.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the chamber is shaped todefine at least one optical axis and the at least partially collimatedelectromagnetic radiation is directed so as to preferentially propagatealong the optical axis.

According to one optional feature of the invention which can be usedwith any of the other features defined herein said at least one opticalaxis includes at least one change in direction or the path can be astraight line.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for applying electromagnetic radiation to reactant materials in areaction chamber comprising:

introducing the electromagnetic radiation into the chamber;

and increasing the probability of interaction of the electromagneticradiation with the reactant materials by using multiple reflections toincrease the optical path length of the electromagnetic radiationthrough the reaction chamber;

wherein the electromagnetic radiation is UV light at a selectedwavelength;

wherein at least one reflective surface of the reaction chambercomprises a dielectric mirror with reflectivity at the selectedwavelengths greater than 99%.

According to one optional feature of the invention which can be usedwith any of the other features defined herein at least one reflectivesurface of the reaction chamber comprises a dielectric mirror withreflectivity at the selected wavelengths greater than 99% and anotherreflective surface comprises a reflective material of reducedreflectivity.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the dielectric mirrorcomprises a stack of layers which has a first area arranged withselected thicknesses of the layers such that the incident ray of lightis reflected by the stack if the angle of incidence of the ray fallswithin a first predetermined range of angles and is transmitted throughthe stack if the angle of incidence of the ray falls in a differentpredetermined range of angles and the stack has a second area arrangedwith selected thicknesses of the layers such that the incident ray oflight is reflected by the stack if the angle of incidence of the rayfalls within a second predetermined range of angles different from thefirst predetermined range of angles and is transmitted through the stackif the angle of incidence of the ray falls in a different predeterminedrange of angles. In this arrangement, preferably the second range doesnot overlap the first range.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for reflecting an incident ray of electromagnetic radiationcomprising:

providing a dielectric mirror formed by plurality of layers ofdielectric materials arranged in a stack;

wherein the stack has a first area arranged with selected thicknesses ofthe layers such that the incident ray of light is reflected by the stackif the angle of incidence of the ray falls within a first predeterminedrange of angles and is transmitted through the stack if the angle ofincidence of the ray falls in a different predetermined range of angles

and wherein the stack has a second area arranged with selectedthicknesses of the layers such that the incident ray of light isreflected by the stack if the angle of incidence of the ray falls withina second predetermined range of angles different from the firstpredetermined range of angles and is transmitted through the stack ifthe angle of incidence of the ray falls in a different predeterminedrange of angles.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for applying electromagnetic radiation to reactant materials in areaction chamber comprising:

introducing the electromagnetic radiation into the chamber;

and increasing the probability of interaction of the electromagneticradiation with the reactant materials by using multiple reflections toincrease the optical path length of the electromagnetic radiationthrough the reaction chamber;

wherein the chamber includes at least a portion formed by a dielectricmirror defined by layers carried on a substrate;

wherein the electromagnetic radiation has a wavelength selected so thatthe dielectric mirror reflects the electromagnetic radiation at thewavelength at a first percentage;

In this arrangement, preferably the dielectric mirror is substantiallytransparent at the second wavelength.

In this arrangement, preferably Raman scattered radiation is collectedfrom the reaction chamber and analyzed to provide information about atleast one reactive material.

In this arrangement, preferably infrared radiation transverses thechamber multiple times and the infrared absorption is analyzed toprovide information about at least one reactive material, which can beused to control the parameters of the treatment.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided anapparatus for reflecting an incident ray of electromagnetic radiationcomprising:

a dielectric mirror formed by plurality of layers of dielectricmaterials arranged in a stack;

wherein the dielectric mirror comprises a plurality of separatedielectric mirror components each formed by plurality of layers ofdielectric materials arranged in a stack;

the mirror components being mounted on a flexible supporting substratewith each mirror component movable relative to the next to follow aflexing movement of the substrate.

In this arrangement, preferably each mirror component is rigid.

In this arrangement, preferably the mirror components are arranged in anarray edge to edge.

In this arrangement, preferably the mirrors are arranged in an arraywhere some of the mirror components overlap others of the mirrorcomponents so that electromagnetic radiation passing between two of themirror components is reflected by an underlying third of the mirrorcomponents.

In this arrangement, preferably each mirror component is separatelyconnected to the substrate.

In this arrangement, each mirror component can be attached to thesubstrate by adhesive.

In this arrangement, each mirror component can be attached to thesubstrate by electrostatic forces.

In this arrangement, each mirror component can be attached to thesubstrate as part of an ink layer.

In this arrangement, each mirror component can include a mounting armwhich is attached to the substrate. In this arrangement, preferably themounting arm includes an opening through which a fiber or wire or thelike of the substrate passes. In this arrangement, preferably themounting arm of some mirror components is longer than for other mirrorcomponents to hold the mirror components in an overlapping array. Inthis arrangement, preferably each mirror component has an aspect ratioof 10:1 or more. In this arrangement, preferably each mirror componenthas a linear dimension in the range of 10 microns to 2000 microns.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for sterilizing airflow comprising:

providing a mask of a respirator having an airflow duct for air enteringor exiting the mask;

the air flow duct including a treatment chamber though which the airpasses in a stream;

introducing electromagnetic radiation into the chamber operable tosterilize the air;

and increasing the probability of interaction of the electromagneticradiation with the reactant materials by using multiple reflections toincrease the optical path length of the electromagnetic radiationthrough the reaction chamber;

According to one optional feature of the invention which can be usedwith any of the other features defined herein the chamber is mounted onheadwear.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the headwear includes aface shield and the duct includes an aperture proximate to the top ofthe face shield.

According to one optional feature of the invention which can be usedwith any of the other features defined herein there is provided an airmovement device which generates positive air pressure between the faceof the wearer and the mask. In this arrangement, preferably the chamberis deformable or collapsible. In this arrangement, preferably there isprovided an expandable bladder for receiving excess air in the event ofa sneeze or cough and wherein the bladder vents air at a controlled rateinto the treatment chamber In this arrangement, preferably there isprovided a sensor which detects an increase in air pressure associatedwith a cough or sneeze and wherein an amplitude of the radiation isincreased.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for sterilizing particles comprising:

singulating the particles into a stream of the particles arranged in aspaced row of the particles;

providing a treatment chamber though which the particles pass in thestream;

introducing electromagnetic radiation into the chamber operable tosterilize the particles;

and increasing the probability of interaction of the electromagneticradiation with the particles by using multiple reflections to increasethe optical path length of the electromagnetic radiation through thetreatment chamber.

In this arrangement, preferably the particles are singulated by passingthrough at least one duct carried on a rotating member so thatcentrifugal forces generated by rotation of the rotating member overcomefrictional forces between the particles and the duct to causeacceleration and separation of the particles in the duct.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for applying electromagnetic radiation to reactant materials in areaction chamber comprising:

introducing the electromagnetic radiation into the chamber;

and increasing the probability of interaction of the electromagneticradiation with the reactant materials by using multiple reflections toincrease the optical path length of the electromagnetic radiationthrough the reaction chamber;

the chamber having at least one port between an interior and anexterior;

wherein there is provided a mirror outside of said port so as to reflectescaping electromagnetic radiation back into the chamber.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for sterilizing a forced air flow in a duct comprising:

passing the air flow through the duct in a stream;

introducing photons into the duct from at least one source operable tosterilize the air flow;

directing the photons in the duct along a specific path;

and arranging at least two reflective surfaces in the duct at spacedpositions so as to cause reflections back and forth between the tworeflective surfaces and thus increase the probability of interaction ofthe electromagnetic radiation with the air flow by increasing theoptical path length of the photons through the duct.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the air flow is generatedby a fan having fan blades and wherein at least one of the reflectivesurfaces is provided by at least one component of the fan.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the air flow is generatedby a fan having fan blades and at least one of the reflective surfacesis provided by at least one blade of the fan.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the air flow is generatedby a fan having fan blades and at least two of the reflective surfacesare provided by blades of the fan to provide reflections between the twoblades.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the air flow is generatedby a fan having fan blades and at least one of the reflective surfacesis provided by a hub of the fan.

According to one optional feature of the invention which can be usedwith any of the other features defined herein another of the reflectivesurfaces comprises a mirror at a position spaced radially outwardly fromthe fan blades.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the fan blades have areflective surface which is different in shape from an air engagingsurface of the fan blade.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the air engaging surfaceis transparent so that the photons pass through to the reflectivesurface.

According to one optional feature of the invention which can be usedwith any of the other features defined herein more than 75% of thereaction chamber interior surface has a specular reflection coefficientfor electromagnetic radiation at the selected wavelengths greater than90%.

According to one optional feature of the invention which can be usedwith any of the other features defined herein at least one reflectivesurface of the reaction chamber comprises a dielectric mirror withreflectivity at the selected wavelengths greater than 99% and anotherreflective surface comprises a reflective material of reducedreflectivity.

According to one optional feature of the invention which can be usedwith any of the other features defined herein electromagnetic radiationis transferred from a first location within the reaction chamber to asecond location within the reaction chamber by a light pipe.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for applying electromagnetic radiation to reactant materials in areaction chamber comprising:

providing at least two reflective surfaces at spaced positions so as tocause reflections back and forth between the two reflective surfaces andthus increase the probability of interaction of the electromagneticradiation with the reactant materials by increasing the optical pathlength of the electromagnetic radiation;

wherein the chamber is shaped to define an optical axis between saidreflective surfaces;

wherein the electromagnetic radiation is introduced into the chamber byat least one source arranged to emit the electromagnetic radiationmainly in the direction of the optical axis.

The optical axis can form a single straight path between the surfaces orthe optical axis can be comprised of a plurality of straight paths wherea redirecting body such as a reflective surface generates a second pathat an angle to the first path.

According to one optional feature of the invention which can be usedwith any of the other features defined herein said at least two sourcescomprise two sources which are located at respective positions spacedoutwardly from the axis and angularly spaced around the axis at an angledifferent from 90 degrees for example at 60 degrees.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the two sources arelocated at respective positions spaced outwardly from the axis.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the source or sources andthe axis are arranged such that the back and forth reflections create avirtual source symmetrically located around the axis relative to thesource which is at 180 degrees to the actual source. Thus a singlesource will generate an additional virtual source at 180 degree spacingand on the same radial distance from the axis. Similarly additionalsources which are preferably therefore not at 180 degree spacinggenerate an array of actual and virtual sources around the axis.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the electromagneticradiation is introduced into the chamber by said at least two LEDsources and the LED sources include separate heat sinks.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the two LED sources eachhave a transverse dimension of an emitting area of less than 1 mm.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided amethod for applying electromagnetic radiation to reactant materials in areaction chamber comprising:

providing at least two reflective surfaces at spaced positions so as tocause reflections back and forth between the two reflective surfaces andthus increase the probability of interaction of the electromagneticradiation with the air flow by increasing the optical path length of theelectromagnetic radiation;

wherein the surfaces are shaped to define an optical axis of said atleast one reflective surface;

wherein the electromagnetic radiation is introduced into the chamber byat least one source;

and wherein said at least one source is located at a position spacedoutwardly from the axis;

wherein said at least one source and the axis arranged such that theback and forth reflections create a virtual source symmetrically locatedaround the axis at a position 180 degrees relative to said at least onesource.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided anapparatus for applying electromagnetic radiation to reactant materialsin a reaction chamber comprising:

a reaction chamber defined by at least one reflective surface arrangedto provide multiple reflections to increase the optical path length ofthe electromagnetic radiation through the reaction chamber;

wherein the electromagnetic radiation is introduced into the chamber byat least two LED sources;

and wherein the LED sources include separate heat sinks separated byenough that little heat diffuses between the LED sources.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided anapparatus for applying electromagnetic radiation to reactant materialsin a reaction chamber comprising:

a reaction chamber defined by at least one reflective surface arrangedto provide multiple reflections to increase the optical path length ofthe electromagnetic radiation through the reaction chamber;

wherein said at least one reflective surface is formed by a mirror layercarried on a substrate;

wherein the electromagnetic radiation is introduced into the chamber byat least one LED;

wherein the LED is carried on the substrate;

and wherein the substrate carries electrically conductive components ofan electrically conductive layer for providing power to the LED.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the substrate additionallycarries thermally conductive components for conducting heat away fromthe LED.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the LED is located at ahole in the mirror layer.

According to one optional feature of the invention which can be usedwith any of the other features defined herein a lens is located in thehole in the mirror layer.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the lens comprises a microlens arranged to reduce the angular divergence of radiation emitted by alight emitting regions of the LED.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the LED has a lightemitting area and the hole is sized to match the size of the lightemitting area.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the electricallyconductive components comprise conductive traces lying longitudinallyalong the substrate beneath the mirror layer.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the conductive traces areseparated by one or more longitudinally extending insulating layers.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the electricallyconductive components form a layer patterned with a network ofconductive strips analogous to a printed circuit board.

According to one optional feature of the invention which can be usedwith any of the other features defined herein the LED has an anode andcathode which are connected to separate conductive traces.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided anapparatus for applying electromagnetic radiation to reactant materialsin a reaction chamber comprising:

a reaction chamber defined by at least one reflective surface arrangedto provide multiple reflections to increase the optical path length ofthe electromagnetic radiation through the reaction chamber;

wherein said at least one reflective surface is formed by a mirror layercarried on a substrate;

wherein the electromagnetic radiation is introduced into the chamber byat least one LED;

wherein the LED is carried on the substrate;

wherein the LED is located at a hole in the mirror layer.

According to one aspect of the invention which can be used independentlyor with any of the other features defined herein there is provided anapparatus for applying electromagnetic radiation to reactant materialsin a reaction chamber comprising:

a reaction chamber defined by at least one reflective surface arrangedto provide multiple reflections to increase the optical path length ofthe electromagnetic radiation through the reaction chamber;

wherein said at least one reflective surface is formed by a mirror layercarried on a substrate;

wherein the electromagnetic radiation is introduced into the chamber byat least one LED;

wherein the LED is carried on a support substrate separate from andmounted on said substrate;

and wherein the support substrate is located with a light emitting areaof the LED positioned at an aperture in the substrate and with an airgap between the substrate and the support substrate.

In this arrangement, preferably the aperture comprises a hole in themirror layer.

In this arrangement, preferably a lens is located in the hole in themirror layer.

According to one important feature of the invention which can be usedalone or on combination with any of the other features of the invention,there is provided an apparatus for reflecting an incident ray ofelectromagnetic radiation comprising:

a dielectric mirror formed by plurality of layers of dielectricmaterials arranged in a stack;

the layers of dielectric materials in the stack being arranged withselected thicknesses such that the incident ray of light is reflected bythe stack if the angle of incidence of the ray falls within apredetermined range of angles and is transmitted through the stack ifthe angle of incidence of the ray falls in a different predeterminedrange of angles;

and a reflective mirror surface located behind the stack so that thetransmitted rays are reflected by the mirror surface back through thestack.

In accordance with another important and independent feature, thereflective mirror surface is immediately adjacent or in contact with arear surface of the stack.

In accordance with another important and independent feature, thereflective mirror surface is integral with a structural support for thestack.

In accordance with another important and independent feature, the stackcontains alternate layers of dielectric materials where a selection ofthe materials and/or the thickness thereof determines the range ofangles.

In accordance with another important and independent feature, thealternate layers comprise high refractive index and low refractive indexmaterials.

According to one important feature of the invention which can be usedalone or on combination with any of the other features of the invention,there is provided an apparatus for reflecting an incident rayelectromagnetic radiation comprising:

a dielectric mirror formed by plurality of layers of dielectricmaterials arranged in a stack;

wherein one part of the stack has a first area arranged with selectedthicknesses such that the incident ray of light is reflected by thestack if the angle of incidence of the ray falls within a firstpredetermined range of angles and is transmitted through the stack ifthe angle of incidence of the ray falls in a different predeterminedrange of angles and a second area arranged with selected thicknessessuch that the incident ray of light is reflected by the stack if theangle of incidence of the ray falls within a second predetermined rangeof angles different from the first predetermined range of angles and istransmitted through the stack if the angle of incidence of the ray fallsin a different predetermined range of angles.

According to one important feature of the invention which can be usedalone or on combination with any of the other features of the invention,there is provided an apparatus for treating reactant materialscomprising:

a treatment chamber;

an arrangement for forming a stream of the reactant materials whichpasses through the chamber in the stream;

a source of photons of UV light arranged to be introduced into thechamber;

one or more dielectric mirrors arranged to increase the probability ofphoton interaction with the reactant materials by using multiplereflections on to increase the optical path length of photons through areaction region of the reaction chamber;

wherein the dielectric mirrors have characteristics defined above orherein.

According to one important feature of the invention which can be usedalone or on combination with any of the other features of the invention,there is provided an apparatus for supplying sterilized air to a wearercomprising:

headwear for wearing by a wearer;

a chamber through which air passes from environment around the headwear;

a source of UV light arranged for sterilizing the air in the chamber;

a duct for carrying the sterilized air from the chamber to a locationadjacent the nose and mouth of the wearer.

In accordance with another important and independent feature, theprobability of photon interaction with the reactant materials isobtained by using multiple reflections to increase the optical pathlength of photons through a reaction region of the reaction chamber.

In accordance with another important and independent feature, theheadwear comprises a helmet. This can be a sports helmet such as for usein hockey, football or the like or can be any other type of helmet suchas for construction or motorcycle or equestrian. The face shield or maskcan be optional so that the sterilized air can be directed from a nozzleto a position in front of the face of the wearer without a confiningmask.

In accordance with another important and independent feature, thechamber is mounted on the headwear. It may be integral but can also bedetachable.

In accordance with another important and independent feature, thechamber is separate from the headwear.

In accordance with another important and independent feature, thechamber is enclosed within the helmet body.

In accordance with another important and independent feature, theheadwear includes a face shield.

Preferably the duct includes an aperture proximate to the top of theface shield.

Preferably there is provided an air movement device which generatespositive air pressure between the face of the wearer and the face shield

Preferably the duct includes a nozzle a direction of which adjustable.

In accordance with another important and independent feature, whereinthere is provided an air cooler.

In accordance with another important and independent feature, theheadwear can comprise a hat, headband or balaclava. This can carry or becombined with a mask or shield in front of the face of the wearer.

Preferably each mirror is flat so that it has an aspect ratio of 10:1 ormore.

Preferably each mirror is a micro-mirror so that it has a lineardimension in the range of 10 microns to 2000 microns.

In accordance with another important and independent feature, theflexible substrate can be used to form a chamber which is deformable orcollapsible.

In accordance with another important and independent feature, theflexible substrate can be used to form a support for a dielectric mirrorwhich flexes in response to environmental activity to prevent fracturingof the dielectric mirror.

The mirror arrangement herein can be used in many different situations.For example it can be used in a multi-pass photochemistry system thatincreases the probability of photon interaction with reactant materialby increasing the optical path length of photons through a reactionregion.

In one important application the reactant is a chemical substance thatis modified by a photochemical reaction.

In another important application, a first reactant, which may be acatalyst or electron donor acceptor (EDA), is raised to an excited stateby absorption of one or more photons and said reactant in excited statereacts with a second reactant.

In an important application, the reactant material is a pathogen andabsorption of one or more ultraviolet (UV) photons modifies the chemicalstructure of bio-molecules such as nucleic acids within the pathogenthereby inactivating the pathogen. The pathogen may be suspended asparticles or droplets in air. The pathogen may be surrounded by a liquidsolution, for example water and biological molecules. The pathogen maybe attached to a surface, for example a food product.

The arrangement herein may provide one or more of the following featuresand objectives. A first objective of the present invention is to providean energy efficient reaction system thereby reducing the cost of UVsterilization and photochemistry applications. A second objective of thepresent invention is to reduce the exposure time required for a givenenergy input. A further objective of the present invention is to providea compact UV sterilization system for space sensitive applications. Aparticular objective is to provide a real-time UV sterilization system.There may be a net cost reduction because the reflective opticsgenerally cost less than light sources, particularly in the UV spectralregion, and further there may be a reduction in operating cost as lesspower is required for fewer light sources.

In the present invention the effective optical path length is multipliedby using highly reflective surfaces arranged to direct photons along apredetermined optical axis across the same reaction volume multipletimes, thereby amplifying the probability that a photon will interactwith a sample material. A reaction chamber may have a plurality ofpredetermined optical axes within the scope of the invention wherein thephoton flux along a first optical axis is substantially independent ofphoton flux along a second optical axis: that is a photon associatedwith a first optical axis has a less than 10% probability of becomingassociated with a second optical axis. For example, a first optical axismay be perpendicular to a second optical axis wherein the first andsecond optical axes contain a common sample interaction volume. Apredetermined optical axis may consist of a sequence of segments whereineach segment has a different direction and wherein substantially all(>90%) of the photon flux in a first segment is transferred to the nextsegment in the sequence. The sequence of segments may for example form aclosed loop with N segments wherein photon flux from the Nth segment istransferred to the first segment. Photon flux is added to the reactionchamber in the direction of an optical axis and preferably displacedfrom the optical axis. Photon flux emitted from a source located on anoptical axis has a higher probability of being reflected back to thesource and being absorbed than photon flux emitted from a sourcedisplaced from an optical axis. Conversely the probability that photonflux emitted from a source displaced from an optical axis escapes theoptical axis increases with displacement from the optical axis. Theinventors found that the optimal source placement for concave sphericalend mirrors is a displacement of 0.62 times the mirror radius from theoptical axis. Lesser or greater displacements ranging from zero (onaxis) to greater than the mirror radius may be used, but are notoptimal. The arrangement herein is primarily concerned with a singlestraight optical axis between the reflective surfaces, but may useoptions such as multiple or bent paths. This makes the distinctionbetween ray segments associated with each axis fuzzy. Below the recipeis to select the axis with the highest order parameter for a consecutivesequence of ray segments.

A reactive material moves on a path through the reaction volume,possibly entrained in a carrier fluid. The optical enhancement islimited only by the reflectivity of the reflective surfaces as theintensity of the reflected photons decreases as I=R^(N), where I is theintensity, R is the reflection coefficient of the surface, and N is thenumber of reflections. The reflectivity depends on material propertiesof the reflecting surface and the angle of incidence. By directingphotons along a predetermined optical axis, the reflectivity R can bemaximized. The effective intensity is the sum of electromagneticradiation intensities passing through the sample volume.

The electromagnetic radiation intensities may be modeled by a set of raysegments in a sequence wherein each ray segment has an origin vector,direction vector, polarization vector, and phase. The direction vectoris in the direction of the Poynting vector and the polarization vectorrepresents the electric field amplitude. The intensity, or equivalentlynumber of photons passing through a test surface per unit time, isproportional to the electric field amplitude squared. The first raysegment in each sequence has a pre-set number of photons large enoughthat statistical fluctuations are insignificant. At each interactionwith a sample material or surface, a new ray segment is generated withorigin at the location of the sample material or surface intersection.Hence the length of each ray segment is the distance traveled from thepoint of origin to the point of interaction. In general, the directionand phase are changed and the amplitude is reduced with eachinteraction. Longer ray segments correspond to greater photon lifetimesfor photons included in the segment amplitude and hence greaterprobability of interacting with sample material. Hence, the presentinvention statistically maximizes ray segment lengths by the arrangementof reflective surfaces (within system volume constraints).

The term ray path herein refers to the set of ray segments generated byone original ray. Each ray path may be traced until the intensity fallsbelow a threshold value. Unless otherwise specified, the threshold valueused herein is 0.0001 of original intensity. The optical path length foreach ray path herein is defined as the sum of ray segment lengths forwhich the intensity is above the threshold.

The number of reflections herein refers to the number of ray segments ina ray path for which the intensity is above the threshold value.

The term amplification herein refers to the sum of ray segmentintensities wherein the intensity of each ray segment included in thesum is above the threshold value. Theoretically the amplification for aclosed chamber is given by

A=1/(1−R)

where R is the reflectivity of the chamber walls. For a reflectioncoefficient of 0.90 typical of an aluminum mirror, the maximumtheoretical enhancement is 10λ. For a reflection coefficient of 0.9975typical of a narrow band dielectric mirror the maximum theoreticalenhancement is 400×. The theoretical limit is not realizable due tooptical losses caused by necessary features such as light sources,absorption by the reactive material, carrier fluid, and ports for inputand output of reactive material and carrier fluid. The present inventionconfigures reflective surfaces to obtain a substantial fraction of thetheoretical amplification limit.

The term segment moment herein refers to the product of the displacementvector (from the ray segment origin to the point of intersection with asurface) of a ray segment multiplied by the intensity of the segment.The segment moment is a more useful measure of photonic efficiency thanamplification because the segment moment accounts for the photonlifetime. Useful statistics can be calculated by summing ray segmentmoment magnitudes and by summing ray segment moment component magnitudeswherein the ray segment moment components are projections of the raysegment moments onto axes parallel and perpendicular to a predeterminedoptical axis.

The order parameter S is a useful measure of the degree of alignment ofray segments with a predetermined optical axis. S is defined herein as

S=<½(3 cos²(q)−1)>

Where q is the angle between the direction vector of each ray segmentand a predetermined optical axis and the angle brackets indicate anaverage over all ray segments. In an isotropic system, such as a chamberlined with a diffuse reflector S is close to zero, generally less than0.1. In an anisotropic system such as a laser cavity S is close to one.A consecutive sequence of ray segments is associated with apredetermined first optical axis if the order parameter for saidsequence is larger than the order parameter for any second predeterminedoptical axis.

The sample volume may be divided into sub volume elements and theradiation flux through each sub volume element may be calculated bysumming the intensities of each ray segment weighted by the distance.

The reflective surfaces of the reaction chamber are collectivelyarranged to preferentially direct photon flux along a predeterminedoptical axis so as to increase the order parameter relative to saidpredetermined optical axis. For each optical axis the order parameter isat least 0.2. Preferably the order parameter is at least 0.5. Mostpreferably the order parameter is at least 0.8. Put another way, themoment relative to the optical axis is at least twice the moment of anyaxis perpendicular to the optical axis. Preferably the moment relativeto the optical axis is at least five times the moment of any axisperpendicular to the optical axis.

Preferably the source of radiation is at least partially collimated andthe at least partially collimated radiation is directed so as topreferentially propagate along a reaction chamber optical axis.

Preferably radiation enters the reaction chamber through an aperturewherein the aperture is sized and positioned to maximize the probabilitythat photons emitted through the aperture are propagated a plurality oftimes along ray segments at least partially aligned with a predeterminedoptical axis minimize the probability that a photon emitted through saidaperture is directed back into said aperture by reflective surfaces ofthe reaction chamber. These dual objectives are met by minimizing theaperture size and positioning the aperture axis parallel to anddisplaced from the predetermined optical axis.

Preferably the reflective surfaces of the reaction chamber aredielectric. Preferably each region of the dielectric surfaces isfabricated so as to maximize reflectivity for a selected range ofwavelengths at a selected range of angles of incidence for each surfaceregion wherein the orientation of each surface region (and hence anglesof incidence) is selected to increase the order parameter for radiationpropagated relative to a predetermined optical axis.

Due to the optical amplification, the required flux of photons requiredto deliver a given dose is reduced by the effective amplificationfactor, thereby reducing the cost of light sources required for a givenreactive material throughput. The reduced cost of light sources ispartially offset by the increased expense of highly reflective opticalsurfaces. Optical amplification may also be used to reduce the timerequired to carry out a photochemical reaction, for example the timerequired to sterilize a volume of fluid. Significantly, the presentinvention provides a means to sterilize air on a time scale comparablewith human breathing enabling the deployment of re-useable masks to stopthe spread of pandemic virus.

In accordance with an important feature of the invention, there isprovided a reaction chamber, a source of electromagnetic radiation (EM)in communication with the reaction chamber, a reactant material, aninput port, an output port, a plurality of flow paths between the inputport and output port and a plurality of paths for EM radiation whereinat least one path for EM radiation includes at least two reflectionsfrom at least two reflective regions of the reaction chamber surface andwherein at least one EM radiation path intersects each flow path. Thereactive material may be a fluid or entrained in a fluid. Preferably amajority of EM radiation paths include at least two reflections fromreflective regions of the reaction chamber surface. Preferably amajority of EM radiation paths include at least ten reflections fromreflective regions of the reaction chamber surface. Most preferably amajority of EM radiation paths include more than one hundred reflectionsfrom reflective regions of the reaction chamber surface.

The number of reflections is calculated as the number of times a ray isincident on and reflected from a reaction chamber surface with intensitygreater than threshold intensity equal to 0.0001 of its initialintensity. There are two requirements: firstly that the path is withinthe reaction chamber and secondly that the intensity is greater than thethreshold intensity. For purposes of this calculation a path thatincludes a ray that exits the reaction chamber and is reflected backinto the reaction chamber is deemed to be within the reaction chamber.The reflection back into the reaction chamber is a feature of theinvention. A path is terminated if a ray permanently exits the reactionchamber, for example through a port. Theoretically an EM wave can bereflected an infinite number of times between two surfaces. The sum ofintensity for an infinite number of reflections is 1/(1−R) where R isthe reflectivity. The threshold is chosen so that the calculated sumincludes 99.99% of the intensity that would be calculated if the sumincluded an infinite number of terms. For surfaces with constantreflectivity R the number of reflections N is given by N=log(t)/log(R).For example, for aluminum with average reflectivity of 92%, the numberof reflections over the threshold is 110. For a dielectric mirror withreflectivity 99% the number of reflections over the threshold is 916.However, the reflectivity depends on the angle of incidence andpolarization of the EM radiation which in general are different for eachreflection from the reaction chamber surface. The reaction chamber isshaped to maximize the number of reflections with high reflectivity andto minimize the number of reflections with low (or zero) reflectivity.

Preferably the reflective regions of the reaction chamber surfacereflect at least half of incident EM radiation. More preferably thereflective regions of the reaction chamber surface reflect at least 90%of incident EM radiation. More preferably the reflective regions of thereaction chamber surface reflect at least 99% of incident EM radiation.Most preferably the reflective regions of the reaction chamber surfacereflect at least 99.9% of incident EM radiation. The reaction chamber isshaped and formed to maximize the number of EM radiation reflections andto maximize the number of times an EM radiation path intersects a flowpath.

The EM radiation source may for example be a lamp filament, a laser, agas vapor discharge tube, or a LED. The term “EM radiation source”includes the EM emitter and all circuitry and power supplies associatedwith and required for the emitter to operate. The EM radiation sourcemay emit EM radiation over a range of similar wavelengths characterizedby a central wavelength and a bandwidth. Unless explicitly statedotherwise, all references to an EM wavelength herein refer to a band ofwavelengths labeled by the central wavelength of the band. Unlessotherwise stated, the term “EM radiation” herein refers toelectromagnetic radiation with wavelengths between 180 nm and 700 nm.

In an important embodiment, the EM radiation has wavelengths in the UVCrange of 180 nm to 300 nm. For embodiments with wavelengths in the UVCrange the term “sterilization chamber” may be used in place of, orinterchangeably with the term “reaction chamber” to specify the intendedoperating wavelengths. The UV wavelength or wavelengths emitted into thesterilization chamber may vary according to the type of microorganism tobe inactivated. The UV wavelengths may be chosen to correspond withabsorption bands of the microorganism(s) to be inactivated. The UVwavelengths may be chosen to generate ozone or oxygen radicals that harmor damage the microorganism to be inactivated. The UV wavelength may forexample be approximately 255 nm, known to be germicidal. The UVwavelength may for example be approximately 265 nm, known to begermicidal.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided at least one region of the reaction chamber thatreflects EM radiation specularly. The macroscopic angle of reflection isequal to the macroscopic angle of incidence. Specular reflection regionsmay for example be mirrors. The mirrors may for example be coatedaluminum with typical reflectivity of approximately 95% in the UVCregion. The mirrors may for example be dielectric mirrors withreflectivity over a bandwidth of 100 nm greater than 99%.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided at least one region of the reaction chamber thatabsorbs EM radiation. Absorbing regions may be located proximate to theinput port, the output port, or both. The absorbing regions function toprevent transmission of EM radiation from inside the reaction chamber tooutside the reaction chamber.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided at least one region of the reaction chamber thatreflects at least a portion of EM radiation diffusely. For example, amirror may include features that scatter radiation at non-specularangles. The features may for example be scratches or tooling marks thatare deliberately retained for the purpose of reflecting a smallpercentage of incident radiation at non-specular angles. Diffusereflectance regions may be used to homogenize the intensity of EMradiation within the reaction chamber.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided a fluid flow chamber wherein the fluid flow chamber iscomprised of a material that transmits EM radiation and wherein thefluid flow chamber is contained within the reaction chamber. The fluidflow chamber is formed and shaped to confine fluid flow to regions withhigh EM radiation field density. The fluid flow chamber may for examplebe comprised of quartz, sapphire, fused silica, or other UV transparentmaterial.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided a particulate filter. The particulate filter isoperable to remove and retain particles with size greater than athreshold size from the fluid. The threshold size is selected to reduceaccumulation of particles on reflective surfaces. The particulate filtermay be proximate to the input port. The primary purpose of theparticulate filter is to prevent fouling of reflective surfaces andconsequent degradation of reflectivity.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided a plurality of fluid flow chambers within the reactionchamber wherein each fluid flow chamber has input and output portsdistinct from the input and output ports of another fluid flow chamber.For example, the sterilization chamber may be integral to a medicalrespirator wherein a first fluid flow chamber may be used to sterilizeair inhaled and a second fluid flow chamber may be used to sterilize airexhaled.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided a plurality of electrodes operable to generate anelectric field within the sterilization chamber. The electric field mayvary temporally and spatially within the chamber. The electric field isoperable to orient molecules within reactive materials relative to thepolarization of the EM radiation field at a location in the reactionchamber. EM radiation may become polarized after multiple reflectionsand the polarization may vary spatially within the reaction chamber. Thepurpose of the electric field is to preferentially orient a moleculartransition dipole moment in the direction of EM polarization so as toincrease the probability that a photon is absorbed by the molecule.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided a fluid flow regulation means. The fluid flowregulation means may for example be a pump, fan, or valve that changesthe rate of fluid flow through the reaction chamber.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided a spectroscopy port integral to the reaction chamber.The spectroscopy port may include a radiation emitting device, aradiation receiving device and a radiation measuring device. Thespectroscopy port may for example be used to provide information aboutthe type and concentration of microorganisms present. The spectroscopyport may for example be used to provide information about the viabilityof microorganisms. The spectroscopy port may for example include aninfrared spectrometer or a Raman spectrometer wherein the infrared orRaman spectrum provides a spectral fingerprint of microorganismspresent. In one embodiment, the UV source excites a Raman spectrum andRaman scattered radiation is analyzed by a spectrometer. In anotherembodiment infrared radiation is reflected by reaction chamber surfacesa plurality of times to interact with a plurality of fluid flowlocations and the infrared radiation is analyzed to provide informationabout a material in the flow. The material may for example be an exhaledmetabolic product such as carbon dioxide, methane, ketones, aldehydes,alcohols, hydrocarbons and various volatile organic compounds (VOCs).The material may for example be a biological material. The informationobtained can be used to control the various parameters of the processincluding intensity and flow rate.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided a flow rate measurement means. The flow ratemeasurement means may for example be a flow meter.

In accordance with an important optional feature of the invention whichcan be used independently with any of the above or following features,there is provided a control means operable to change at least oneoperating parameter of the reaction chamber. The operating parameter mayfor example be the wavelength and/or intensity of EM radiation providedby the EM radiation source. The operating parameter may for example bethe fluid flow rate through the reaction chamber. The operatingparameter may for example be the electric field generated at a locationin the reaction chamber.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the reaction chamber has the generalshape of a confocal cavity wherein light may be reflected betweenopposing surfaces an infinite number of times suffering losses only dueto absorption.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the reaction chamber has the generalshape of a White cell, differing from a White cell insofar as no opticaloutput port is provided and is instead replaced with a reflectivesurface.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the reaction chamber has the generalshape of a Herriott cell, differing from a Herriott cell insofar as nooptical output port is provided and is instead replaced with areflective surface.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the reaction chamber has the generalshape of a circular multipass cell, differing from a circular multipasscell insofar as no optical output port is provided and is insteadreplaced with a reflective surface.

The term “apparatus” is used herein to refer to thereaction/sterilization chamber and all associated structures.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the reaction chamber functions as asterilization apparatus is used to neutralize or deactivate aninfectious agent wherein the infectious agent is a prion, virus,bacteria, fungi, protozoan, helminth, yeast, or biological warfareagent. In some embodiments the sterilization apparatus neutralizes ordeactivates infectious agents in air, for example in a HVAC system for abuilding. In some embodiments the sterilization apparatus neutralizes ordeactivates infectious agents in water, for example in a municipaldrinking water system or in a municipal wastewater treatment system. Insome embodiments the sterilization apparatus neutralizes or deactivatesinfectious agents in a cryogenic fluid, for example in tissue bank,culture bank, or blood bank stored under liquid nitrogen.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the reaction apparatus is used toneutralize or deactivate a chemical agent. The chemical agent may forexample be a toxin such as an insecticide, fungicide, or herbicide thatis sprayed for agricultural use. The chemical agent may for example be achemical warfare agent. The reaction apparatus processes air to limithuman exposure to the toxin. The reaction apparatus may neutralize ordeactivate chemical agents by photo-disintegration or by photo-catalysisof a reaction that destroys the chemical agent. The wavelength of EMradiation is adjusted to maximize absorption by the chemical agent.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the reflective surfaces of thereaction chamber are formed and shaped such that the intensity of EMradiation at a location in the reaction chamber is at least in partproportional to the fluid flow rate at that location. In a relatedembodiment, the reflective surfaces of the reaction chamber are formedand shaped such that the EM radiation dose received by a fluid elementintegrated over each fluid flow path is greater than a required dosethreshold. The density of EM radiation (photons per unit volume) at alocation along a fluid flow path may be increased by angling areflective surface to reflect EM radiation along a path through thefluid flow location.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the control means determines thetime a fluid element spends at each location along a fluid path andadjusts the intensity of EM radiation such that the integrated intensityof EM radiation received along the fluid flow path is greater than athreshold required dose. This embodiment is useful in applications witha temporally varying flow rate.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the control means determines a typeof microorganism present in a fluid element and adjusts the intensity ofUV radiation such that the integrated intensity of UV radiation receivedalong the fluid flow path is greater than a threshold required dose forsaid microorganism type. The control means may for example determine atype of microorganism by comparing the infrared or Raman spectrum of afluid element with a spectral database.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the fluid entering the reactionchamber at the input port is a liquid. The liquid may for example bewater or a water solution. The liquid may for example be solventcontaining monomers that are polymerized by a photochemical reaction.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, a micro-fluidic array is integral tothe reaction chamber. The micro-fluidic channels may for example be usedto produce pharmaceutical products such as anti-malaria drug Artemisininvia photochemical reactions. In some embodiments a plurality ofdifferent reactant materials flow along different micro-fluidicchannels, are converted into intermediate products by photochemicalreactions, and the plurality of intermediate products are combined toform a final product in a final photochemical reaction.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the sterilization apparatus may beintegral with drinking water infrastructure such as a municipal watertreatment plant. The sterilization apparatus may for example be used ina municipal water treatment plant. The multiple reflection arrangementof the sterilization apparatus reduces the amount of UV radiationrequired, and hence the electric power requirement resulting in loweroperating cost. The sterilization apparatus may for example be integralwith or in line with a drinking water outlet in a commercial orresidential building. The sterilization apparatus for drinking waterapplication may replace or supplement filters that are prone todevelopment of bacteria biofilms. The sterilization apparatus may forexample be used with a portable water supply wherein the fluid flow pathis a reservoir of disinfected water. The fluid flow path may for examplehold one liter of water and UV radiation is supplied for a disinfectionperiod wherein the disinfection period is found by experiment to beeffective. The sterilization apparatus may be used for example toprovide a laboratory with sterile water wherein the water is sterilizedimmediately before use.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the fluid entering the sterilizationchamber at the input port is a gas. The gas may for example be air.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the sterilization apparatus isintegral with a face mask. The face mask includes an air chamberproximate to the nose and mouth. The air chamber may be comprised of atransparent material. The air chamber may be sealed to the face with asoft compliant gasket material. The air chamber may be connected withone or more ports of a sterilization chamber. In one embodiment, air isinhaled and exhaled through the same port. In a second embodiment, airis inhaled through a port connected with a sterilization chamber andexhaled through a flap valve in the air chamber opened by positive airpressure. In a third embodiment, air is inhaled through a port connectedwith a first fluid flow path through the sterilization chamber and airis exhaled through a port connected with a second fluid flow paththrough the sterilization chamber. In some embodiments the fluid flowpaths may be removed for cleaning or replacement.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the sterilization apparatus isintegral with a medical respirator. In this embodiment, inhaled andexhaled air is sterilized to prevent cross contamination. Preferably atleast one property of the exhaled air is measured to provide informationabout a health condition. The property may be measured for example withthe spectrometer port.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the sterilization apparatus isintegral with a portable air cleaning unit. In this embodiment air isdrawn into the portable unit with a fan, passes through thesterilization apparatus, and is discharged. The portable unit may beused for example to reduce the concentration of an infectious agent suchas a virus in a room. The portable unit may for example be operated in aroom occupied by a person infected with a virus to reduce the risk ofinfection spreading through air to adjacent rooms. The portable unit mayfor example be integrated into a dental evacuator proximate to apatient's face to collect and sterilize air exhaled by the patientduring dental procedures.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the sterilization apparatus isintegral with the air distribution system of a vehicle. For example, thesterilization apparatus may provide a stream of sterilized air to eachpassenger in a car, bus, ship, or airplane. For example, thesterilization apparatus may accept air drawn from the immediate vicinityof each passenger in a car, bus, ship, or airplane.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the sterilization apparatus isintegral with the heating and ventilation system of a building. Thesterilization apparatus may for example be integral to a central heatingand air conditioning plant. The sterilization apparatus may for examplebe integral with ducts supplying each room or region thereof. Thesterilization apparatus may for example be integral with the air supplyof an elevator. The sterilization apparatus may for example be integralwith a ducts supplying each cubicle in an office. The sterilizationapparatus may also be used in the HVAC systems supplying sterilized airto clean rooms and labs. For example, sterile air is required to preventmicrobial contamination in processes that are sensitive to microbialcontamination such as pharmaceutical, biologic, medical deviceproduction and packaging as well as diagnostic procedures andmicrobiology experiments. The sterilization apparatus may also forexample be integrated into a biocontainment lab or biocontainmentchamber to disinfect air leaving the biocontainment area.

In an embodiment that may be used in combination with any of thepreceding or following embodiments, the reactive material is the surfaceof a solid object that is passed through the reaction chamber. The solidobject may for example fall under the influence of gravity through areaction chamber without contacting the reaction chamber walls. Thesolid object may for example be entrained in a fluid flow. The solidobject may for example be a polymer block wherein the surface isactivated for a subsequent reaction by irradiation with electromagneticradiation. The solid object may for example be a surgical instrument,medical device or personal protective equipment that is sterilized byirradiation with UVC radiation. The solid object may for example be afood object such as a chicken breast with Salmonella inactivated byirradiation with UVC radiation. The solid object may for example be acontainer used to package a medical device, pharmaceutical, or foodproduct. The solid object may for example be a package for a consumerproduct irradiated in the reaction chamber with UVC radiation to preventthe transmission of an infectious agent by postal or courier delivery.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic illustration of an arrangement according to thepresent invention for use in an air disinfection system for a face mask.

FIG. 2 is a schematic illustration of an arrangement according to thepresent invention for use in a photochemistry reactor.

FIG. 3A is a cross sectional view of an arrangement according to thepresent invention for use in a water sterilization reactor.

FIG. 3B is an axial view of the water sterilization reactor of FIG. 3A.

FIG. 4 is a schematic illustration of an arrangement according to thepresent invention for use in irradiation of solid objects.

FIG. 5 is a schematic illustration of an arrangement according to thepresent invention for use in sanitizing air flow in an air duct of aHVAC system.

FIG. 6 is a schematic illustration of an arrangement according to thepresent invention for use in treatment of a fluid.

FIG. 6A is a cross-section along the lines A-B of FIG. 6.

FIG. 7 is a schematic illustration of an arrangement according to thepresent invention for use in treatment of a water supply.

FIG. 8 is a schematic side elevational view of a fan arrangementaccording to the present invention for use in a chamber of a forced airsystem.

FIG. 9 is a schematic side elevational view of a fan arrangementaccording to the present invention for use in a chamber of a forced airsystem.

FIG. 10A shows a section of a duct forming a chamber according to thepresent invention for use in a forced air system.

FIG. 10B is a top plan view of the section of FIG. 10A.

FIG. 10C is a top plan view of a section similar to that of FIG. 10Ashowing a modified array of the treatment volumes.

FIG. 10D is a cross-sectional view of the section of FIG. 10A showingthe end caps which generate a treatment volume.

FIG. 11 is a schematic isometric view of a section of a duct forming achamber according to the present invention for use in a forced airsystem.

FIG. 12 is a graph showing the effect of optical amplification relativeto a dimension of a source of the radiation when located on one of themirrors of the opposed mirror arrangements of FIG. 1 or FIG. 6.

FIG. 12A shows a schematic cross-sectional view of a prior artdielectric mirror.

FIG. 12B shows schematic cross-sectional view of an improved dielectricmirror according to the present invention.

FIG. 13 is a graph showing the distribution of angles of incidence for asimulation of the arrangement shown in FIG. 6 wherein the end mirrorsare dielectric mirrors and the side walls are a first surface aluminummirror.

FIG. 14 is a perspective view of a sports helmet with an integralsterilization chamber according to the present invention.

FIG. 15 shows a cross-sectional view of a deformable mirror according tothe present invention.

FIG. 15A shows cross-sectional view of one mirror component of thearrangement of FIG. 15.

FIG. 15B shows a schematic cross-sectional view of a deformable scalemirror array according to the present invention.

FIG. 15C shows cross-sectional view of one mirror component of thearrangement of FIG. 15B.

FIG. 15D is a schematic cross-sectional view of a deformable mirrorcomprised on an ordered array of mirrors according to the presentinvention.

FIG. 15E shows cross-sectional view of one mirror component of thearrangement of FIG. 15A.

FIG. 16A is a schematic view of a portable sterilization chamberconfigured for transport according to the present invention.

FIG. 16B shows a schematic view of a portable sterilization chamberconfigured for operation according to the present invention.

FIG. 16C shows a schematic view of a portable sterilization chamber witha flexible hollow light pipe according to the present invention.

FIG. 17A shows a side view of a further embodiment of a reaction chamberaccording to the present invention.

FIG. 17B is a transverse cross-sectional view of the reaction chamber ofFIG. 17A.

FIGS. 18A, 18B and 18C show intensity sequences of slices through thereaction chamber of FIG. 17A perpendicular to the chamber axis.

FIG. 19 is a plot of reflectivity vs wavelength of the dielectric stacksof FIG. 17A optimized for UV reflectivity.

FIG. 20A shows an enlarged schematic side view of a first arrangement toemit radiation from a surface mount LED through an aperture into thechamber of FIG. 17.

FIG. 20B shows an enlarged schematic side view of a second arrangementto emit radiation from a surface mount LED through an aperture into thechamber of FIG. 17.

FIG. 20C is a plan view of the arrangement of FIG. 20B.

FIG. 21A shows a PRIOR ART scale drawing of a LED mount on a substrate.

FIG. 21B shows a scale drawing of LED light sources embedded in adielectric mirror according to the present invention.

FIG. 22 is a compilation illustration of a number of differentalternatives for the location and arrangement of one or more sources ofthe radiation and different transfer arrangements for carrying theradiation to a required location within the reaction chamber.

DETAILED DESCRIPTION

Embodiments of the present disclosure are described in detail withreference to the accompanying drawings. Detailed descriptions ofconstructions or processes known in the art may be omitted to avoidobscuring the subject matter of the present disclosure. Further in thefollowing description of the present disclosure, various specificdefinitions found in the following description are provided to give ageneral understanding of the present disclosure, and it is apparent tothose skilled in the art that the present disclosure can be implementedwithout such definitions.

FIG. 1 shows schematic view of a portable arrangement generallyindicated at 1 for sterilizing air supplied to a face mask. The majorcomponents are sterilization chamber 2, face mask 3, and control 4.

Sterilization chamber 2 includes input port 25 and output port 30. Oninhalation, air is drawn through input port 25 through particulatefilter 26 along the path indicated at 9. A particulate filter 26operates to remove dust from the incoming air to prevent fouling ofoptical surfaces within the sterilization chamber. The filter mesh ofthe filter 26 is selected to remove most dust without unduly restrictingair flow. As indicated at 27, surfaces proximate to the input and outputports may be comprised of a material that absorbs ultraviolet light. Asindicated at 31 and 32 one or both of the input and output ports mayinclude a sequence of baffles forming a tortuous path to prevent directtransmission of ultraviolet radiation through the port and outside thesterilization chamber. Preferably baffles 31 and 32 have reflectivesurfaces and are shaped to reflect incident radiation back into reactionchamber 2. It will be noted that in order to improve the efficiency ofreflection, the inlet and outlet ports are not on an axis of symmetry ofthe reaction chamber.

As shown, the output port 30 includes a valve 34 that passes air fromthe port 30 and chamber 2 into facemask 3 on inhalation and directsexhaled air from the facemask to an exhaust 33 on exhalation. However,in a preferred embodiment, the valve 34 and exhaust 33 are omitted andexhaled air passes in reverse path through sterilization chamber 2 so asto be sterilized both in inhale and exhale both directions.

Sterilization chamber 2 includes an ultraviolet source 42 which may be adischarge lamp or a LED with peak emission between 200 nm and 410 nm.The ultraviolet source may for example be a LED with peak emission atabout 255 nm available from Seoul Viosys. Ultraviolet rays are emittedfrom source 42 over a range of angles (not shown) into the sterilizationchamber 2. Preferably the ultraviolet source 42 includes an integraloptical element that reduces the angular divergence of emittedradiation. Preferably the angular divergence half angle is 30 degrees orless. Most preferably the angular divergence half angle is 3 degrees orless. An example ultraviolet ray is shown at 5, which is incident onreflective surface 22 and reflected toward reflective surface 23 asindicated as ray 6. The sterilization chamber may include a transparenttube 28 that guides air flow 9 to pass through regions of thesterilization chamber 2 with ultraviolet flux higher than a thresholdflux. As shown schematically the tube forms a straight duct guiding theair flow. In some embodiments (not shown) the transparent tube can formother complex shapes such as a helix so as to form a coiled tube passingthrough the ultraviolet radiation field within the sterilization chambera plurality of times. As shown the ray 6 passes through the transparenttube 28 as indicated at 29 and is reflected specularly by reflectivewall 23 as shown at ray 7. Ray 7 is reflected specularly and focused byend face 24 toward end face 21 as shown at ray 8. The ultraviolet raypath indicated at 5, 6, 7, and 8 will in general include N reflectionswhere N is greater than 2, limited only by the surface reflectivity andoptical losses at ports and the ultraviolet source. With averagereflectivity of 95% and neglecting port losses, the ultraviolet fluxdensity is increased by a factor of 20. With average reflectivity of 99%and neglecting port losses, the ultraviolet flux density is increased bya factor of 100. Transparent tube 29 acts to confine the material to betreated within the tube path so that material passing through the tubepasses through a sequence of regions of the radiation field that deliveran integrated radiation dose higher than a predetermined minimum dose.The tube path for example can be located in an area where the fluxdensity is higher than or more homogeneous than regions exterior to thetube within the remainder of the chamber.

While the concave reflective surfaces 21 and 24 are shown of the sameshape and diameter, this is not required. One of the surfaces can beflat or of a different profile from the other. The surfaces can be ofdifferent shapes and diameters to match the profile of a contained intowhich they are inserted. Thus for example in a water container or bottlea larger end may have a larger surface and an opposed end be smaller

Control 4 receives electrical power from battery 44 through cable 45.When activated by switch 46, electrical power energizes ultravioletsource 42 via cable 43. As shown, the ultraviolet flux in sterilizationchamber 2 is measured by optional detector 36 in communication withcontrol 4 via cable 37. The measured flux may be logged to provide arecord of functionality. In critical applications, the sterilizationchamber may include redundant power supplies and ultraviolet sources(not shown). If the ultraviolet flux exceeds a threshold, indicator 47is activated. Indicator 47 may for example be a green or blue LED orother visual indicator. Facemask 3 as shown includes optional microphone40 in communication with control 4 via cable 41. Audio signals frommicrophone 40 may be broadcast by speaker 48 or wireless transmitter 49to facilitate communication. In some embodiments, a smart phone mayperform some or all of the control functions.

As shown, facemask 3 covers the nose and mouth region of human face 10.Facemask 3 is comprised of impermeable frame material 30 that conformsto the face preventing air exchange except through sterilization chamber2. Preferably the impermeable material is transparent. The facemaskframe may support a membrane region 35 thin enough to transmit humanaudio communications.

In some embodiments of the mask arrangement of FIG. 1, valve 33 directsexhaled air into a bladder shown schematically at 33A and the bladderwhen filled vents air at a controlled rate into the interaction volume2. The bladder is useful for catching the excess volume of a cough orsneeze and directing the excess volume through the sterilization volume2 at a controlled rate such that complete sterilization is achieved.

In some embodiments of the mask arrangement of FIG. 1, the inner surfaceof the mask 3 is lined with layers of a disposable absorbent material(not shown). The absorbent material may catch mucus and saliva from acough or sneeze. The absorbent layer may be removed to present a cleansurface to the mask wearer.

In some embodiments of the mask arrangement of FIG. 1, the mask iscarried on a strap, so as to be readily available but not in place onthe face, and brought to cover the face by the user only when a cough orsneeze is imminent. In this embodiment, the radiation source amplitudeis increased relative to the amplitude required for normal breathing.The air velocity associated with a cough or sneeze is higher that theair velocity associated with normal breathing. In some embodiments thelength of the optical cavity is increased by the ratio of air velocitiesto equalize the residence times of air volume elements in the normalbreathing and cough/sneeze cases.

In some embodiments of the mask arrangement of FIG. 1, a sensor detectsthe increase in air pressure within the mask associated with a cough orsneeze and the amplitude of the radiation field is increased.

In some embodiments of the mask arrangement of FIG. 1, the chamber 2 isdivided, similarly to that in FIG. 2, by a longitudinally extendingtransparent divider so that the air path is doubled in length.

FIG. 2 is a schematic representation of a photochemistry reactorgenerally indicated at 200. Reactive materials enter the reactor chamberat 201 and follow the path indicated at 202 and exit as products at 203.The reactive materials may for example be an odor molecule, a fatmolecule by interaction with electromagnetic radiation. The reactivematerial may for example be pharmaceutical precursors that are assembledinto pharmaceutical molecules in a photochemical reaction. The reactivematerial may for example be waste water that is converted to clean waterby photochemical reactions. The reactive material may include a catalystthat is activated by absorption of photons, or that acts with anactivated reactant. The reactive material may include sensitizermolecules that absorb electromagnetic radiation and transfer a part ofthe energy absorbed to a second reactant. The reactive material mayinclude an electron donor acceptor that participates in a REDOXreaction.

A first source of electromagnetic radiation is indicated at 204 externalto the reaction chamber. Electromagnetic radiation 205 is focused by anoptical system 206 through aperture 207 into reaction chamber 208. Thewalls of the reaction chamber 209 are highly reflective causing theelectromagnetic radiation to reflect between reactor walls as indicated.The radiation that does not interact with a reactive material or thereactor walls exits at ray 210. The amplitude of the electromagneticradiation at ray 210 is a small fraction of the input amplitude in ray205 at opening 207, generally less than 1%: that is the number ofreflections is set such that virtually all of the electromagneticradiation is available to, and used by, the photochemical reactions.

Light source 204 is in communication with control 211, which regulatesthe amplitude of output light from the source to meet the requirementsof a photochemical reaction. The photochemical reactions are monitoredby an infrared spectrometer 212 and a Raman spectrometer 213 located tomeasure different stages of a photochemical process. Both spectrometersare in communication with the control 211. Control 211 may adjust theflow rate of reactive materials by operating a flow rate control 230 andthe amplitude of electromagnetic radiation from the source 204 accordingto feedback from the spectrometers.

Control 211 is connected with a voltage source 215 operable to produce avoltage between electrodes 216 and 217. The voltage difference generatesa electric field that may be used to align reactive molecules relativeto the electromagnetic radiation field. The flow in reactor 200 isguided by a block of transparent material 218 that divides the flow intoan upper channel 219 and a lower channel 220. The transparent blocktransmits more than 90% and preferably more than 99% of incidentelectromagnetic radiation.

A second source of electromagnetic radiation is indicated at 221 incommunication with control 211. Electromagnetic radiation may be coupledinto a light pipe 222 and guided to a location 223 proximate to aphotochemical reaction that utilizes the waveband generated by source221.

A third source of electromagnetic radiation indicated at 224 is an arrayof LED light sources integral with an interior wall of the reactionchamber surface. The LED light sources are in communication with control211 and may be activated individually to produce different wavelengths.Alternately the LED light sources 224 may produce the same waveband andthe array increases the total photonic output. Individual LED's of thearray may be distributed to different regions of the photochemistryreactor.

FIG. 3B shows a water sterilization reactor generally indicated at 300.Water to be treated is pumped into reactor 300 by pump 301 at inlet 302and follows path 303 to outlet 304 with flow meter 305 measuring theflow rate. Control is in communication with pump 301 via cable 307 andflow meter 305 via cable 308. Water flows in channel 309 withtransparent wall 310. The channel 309 may for example be fabricated withquartz or fused silica. As best seen in cross section in FIG. 3A,discharge lamps 311, 312, 313, 314, and 315 are arranged symmetricallyabout water channel 309 and have reflectors 316 shaped to direct UVCradiation toward water channel 309. The reflectors 316 may have acircular or parabolic cross section to reflect UVC radiation towardchannel 309 in a direction generally perpendicular to the axis of 309 asshown at 317.

In FIG. 4 is shown an arrangement 400 for treating solid bodies 403 suchas a chicken breast where bacteria and other pathogens on an outersurface 404 are required to be disinfected or such as a body within amanufacturing process where an exterior coating on the exterior surfaceis required to be activated. These are only examples and many other usesof the system can be found. In this arrangement a duct 402 confines thebodies to pass along a path through the duct. A number of UV sources405, 406, are provided at either side of an inlet 401 and two furthersources 407 and 408 are located at an outlet. The sources all arearranged to direct the UV rays into the interior so as to pass acrossthe duct to an opposed side for multiple reflections back and forth. Thebody is thus irradiated from each side and with a substantiallyhomogeneous flux intensity.

In FIG. 4, the objects 403 to be sterilized can be carried on a suitablesupport such as a conveyor. However in one preferred arrangement, thereis provided a singulation system 410 for singulating the particles froma source 411 into a stream 412 of the particles arranged in a spaced rowof the particles.

Preferably the particles are singulated by passing through at least oneduct carried on a rotating member so that centrifugal forces generatedby rotation of the rotating member overcome frictional forces betweenthe particles and the duct to cause acceleration and separation of theparticles in the duct. An arrangement of this type is shown in PCTPublication 2018/018155 published 1 Feb. 2018 by the present inventors,the disclosure of which is incorporated herein by reference or may bereferenced for further detail of the rotating body and separation ducts.In this arrangement the duct 402 may form one of the ducts on therotating body. The singulation of the particles causes them to beseparated each from the next in an aligned row so that each isaccessible relative to the next to allow the photons from the reflectedbeams to access each without interference from the others. Also thearrangement shown in this publication provides the ability to rotate theparticles both to align their longitudinal axis if they are elongate andto rotate them about the axis. In this way the singulation andorientation provided by this system or by other similar systems allowsall faces of the particles to be impacted by the radiation and properlysterilized

In FIG. 5 is shown an arrangement 500 using an air duct 501 defined bywalls 502 forming a rectangular construction. A fan 508 is mounted at asuitable location in the system so as to drive air through the ductalong the path 509. A source 503 of UV light is mounted in a parabolicreflector 504 powered by a power source and controlled by a controlsystem as previously described. The elongate source lies across the ductand generates rays 505 which reflect back and forth from the wallsparallel to the source in the manner previously described. This can beused to reduce the number of pathogens within the duct by theinteraction with the UV light. Absorption materials and labyrinth sealspreviously described can be used to prevent escape of the UV rays.

In FIG. 6 is shown an arrangement 600 for treating a fluid such as airin which the fluid is fed along a path 602 in a duct 603 driven by a fan601. A flow meter 604 detects the rate of flow which can be used tocontrol the treatment system at a controller 605. A particle filter 606extracts particles to reduce contamination of the reactor. The reactor609 is formed of a cylindrical wall 610 capped at its ends byhemispherical end walls 611 and 612. The end caps are preferably formedof a dielectric mirror. The cylindrical tube may be a dielectric mirroror a reflective metal of lower reflectivity than the dielectric endmirrors. The source 607 directs UV rays into the reactor at the junctionbetween the duct 603 and the reactor. The reactor has an outlet 615 atwhich the stream of fluid 614 escapes with the outlet and inlet beingarranged symmetrically on one side of the center line of the reactor sothat they do not interfere with the reflectivity which is primarilylongitudinal of the reactor between the end caps. A sensor 613 ismounted on the side wall of the reactor to detect one or more conditionswithin the reactor so as to apply control to the light source or sourcesby the controller 605. An additional annular source is located aroundthe side wall of the reactor as shown in FIG. 6A to supplement the UVlight and to form rays which reflect back and between the side walls.

While the end caps 611 and 612 are shown as being hemispherical inshape, parabolic cross-sections can be used.

In some cases, the source can be located at an aperture at a positionbetween the center and periphery of one end cap. However, the source isin some embodiments advantageously located at the edge of one end capsince this requires that the beam is directed inwardly toward the centeraxis connecting the two end caps. This causes the locus of thereflections to lie on a spiral at each end cap moving from the edgecloser to the center axis and this can provide a better coverage by thebeams within the cylindrical volume defined by the reflected beams.

In another arrangement, the wall 610 can be curved along its length sothat its diameter at the center is larger or smaller than its diameterat the end caps. In this way the beams escaping from the cylinderdefined by the end caps impacts the wall at an angle of incidence whichcan be adjusted by the amount of curvature and the direction ofcurvature. This change in the angle of incidence can be used or tailoredrelative to the reflective character of the wall to maximize thereflections and reduce the losses. The wall 610 can be cylindrical or beformed of flat panels to define a polygon.

The chamber into which the fluid is injected as shown in FIG. 6 cancontain devices for fluid disturbance such as impellers or guidesurfaces which direct the fluid into a path to increase interaction withthe radiation. The flow can thus be condoled or turbulent to obtain thebest interaction. Such devices can be located at spaced positions alongthe duct. The entrance and exit ports can communicate with a surroundingring to allow escape around the full periphery of the chamber andconnection to a single port connected to the ring.

When used with liquid, for example for sterilizing water, the chambercan be arranged so that it is fully filled by gravity by the enteringliquid so as to avoid liquid surfaces within the chamber which caninterfere with the radiation paths and cause unsuitable or lessefficient reflections. In this way, entry at the bottom and dischargefrom an exit duct above the top reflective surface is preferred to thatthe chamber is filled up to and above the top reflective surface.

FIG. 7 shows a water treatment system generally indicated at 700. Anexternal light source 701 emits electromagnetic rays 702 that areincident on a reflective collector 703. The external light source may bethe sun. In an alternate arrangement (not shown) the external lightsource is a discharge tube, filament, or LED. The reflective collector703 has a convex shape that focuses reflected electromagnetic radiation704 at collimator mirror 705 to produce collimated beam 706. The convexshape may for example be parabolic or spherical. The combination ofcollector 703, collimator 705 and aperture 707 may be a Cassegrainreflector or a functional equivalent. Control in communication withreflective collector 703 may transmit codes to motors (not shown) thatorient collector 703 relative to the sun to maximize solar radiationcollected. Collimated beam 706 passes through aperture 707 to steeringmirror 708 and is directed to wavelength separator 709 that directsdifferent wavelength along different paths as indicated at 714 and 715.As shown rays 714 with selected wavelengths pass through slit 716 andenter optical cavity 717. A reflective surface 710 reflects a smallconstant fraction of selected wavelengths to detector 711 incommunication with control 712. The reflection at surface 710 may forexample be Fresnel reflection from a glass surface or a polka dotreflector. Detector 711 may be a photodiode and associated circuits thattransmit a voltage proportional to irradiation to control 712. Control712 integrates the irradiation over time to calculate a radiation dosein optical cavity 717. Control 712 is in communication with flowregulator 713 and adjusts the flow rate such that each volume element ofwater receives at least a threshold dose of radiation. Water to betreated enters at port 724, flows through transparent channel 721 andexits at port 725 as indicated by flow line 726. The transparent channelwalls 722 may be fabricated from quartz, sapphire, fused silica or otherUV transparent material. Optical cavity 717 is comprised of reflectiveside walls 718, reflective end walls 719 and 720 and slit 716. Slit 716as shown is located on a side wall, but in an alternative arrangementmay be located on an end wall. As shown, end walls 719 and 720 areconcave so as to form a confocal cavity. In this arrangement photons arereflected between the end walls along the optical cavity axis untilabsorbed. Depending upon the reflectivity of the end walls andabsorption by contaminants in the water, a photon may travel the lengthof the cavity several hundred times before being absorbed. The longoptical path length maximizes the probability of absorption by anunwanted contaminant in the water at low concentration. The reflectiveside walls and end walls may be first surface metal mirrors ordielectric mirrors. In an alternative arrangement (not shown), the endwalls may be plane mirrors. In the plane mirror embodiment, the ray pathwill walk off the end mirrors if the mirrors are not perfectly parallel,but such walk off is of no consequence if the contaminationconcentration (and absorption) is high.

FIG. 8 shows a drum fan in an arrangement generally indicated at 800which is configured to sterilize an air flow with ultraviolet radiation.The arrangement may be used to sterilize air inline in a HVAC system.The drum fan has a casing 801 with inlet 802 and outlet 804. Air flowstoward the inlet along a path indicated at 803 through a duct 830 withan elbow 831. Air flows from the outlet along the path indicated at 805.Drum 808 rotates as shown at 807 about axis 806. The blades 809 areattached to the drum 808 and angled forwardly and outwardly from acylindrical surface of the drum to propel entrained air between the drum808 and the casing 801 from the inlet 802 to the outlet 804. As shown inthe single blade marked at 839 which is shown in isometric so that itsupper surface and length can be seen, all of the blades 809 have areflective surface 840 extending at least the width of the blade asindicated at 810 which is equal to the width of the inlet 802. Theblades 809 may be comprised of a reflective material such as aluminumwith a mirror finish on the surface. The average ultravioletreflectivity of aluminum between 250 nm and 280 nm is about 92% at nearnormal incidence. The blades 809 can also be comprised of a structuralmaterial such as steel with a reflective material coating attached. Thereflective material may be a dielectric mirror.

As described above, the blades act as mirrors in relation to UV lightbeams transmitted from a source 820 at the elbow 831 which reflect backand forth between each blade as it passes the inlet 801 and a concavemirror 822.

As shown, the blades 809 have a plane surface. In some embodiments, eachblade 809 may have a convex outer curved surface shaped to optimize airflow and an inner concave surface which is reflective with a spacebetween the two surfaces. The reflective inner surface is shaped tooptimize the number of reflections between each blade 809 as it passesthe opening and the mirror 822. The gap between the inner curvedreflective surface and outer curved surface may be filled with atransparent material such as fused silica or quartz. The outer surfacedoes not act to cause the reflection so that its shape can beindependent of the inner surface.

Ultraviolet light is emitted and collimated by source 820 toward blade809 and is reflected between blade 809 and mirror 822 a plurality oftimes as indicated by the path 821. Preferably mirror 822 has little orno curvature in a direction 825 parallel to the direction of the drumaxis 806 and has a circular or parabolic profile in the directionindicated at 824. Preferably the distance from the mirror 822 to theblade edge is approximately equal to the focal length of the concavemirror as indicated at 823. The mirror 822 is preferably a dielectricmirror with reflectivity greater than 99% between 250 nm and 280 nm atnear normal incidence. As the drum 808 rotates and when the blade has aflat reflective surface, the angle of incidence of ultraviolet radiationfrom the source 820 onto the blade 809 changes over a range of severaldegrees and radiation is reflected to different portions of the mirror822. The curvature of the mirror 822 causes radiation to be reflected toa position on the blade proximate to the position illuminated by source820. In an embodiment suitable for small angular displacements (lessthan about 6 degrees) between adjacent blades, the optical surface ofthe blade is a plane. In another embodiment suitable for larger angulardisplacements between blades, the optical surface of the blade may beconcavely curved. Preferably the focal length of the blade curvature isabout the same as the focal length of mirror 822.

In the preferred arrangement, the source 820 is located at one edge 844of the mirror and is angled relative to the axis 825 so that radiationincidence from the source 820 has a small direction cosine componentalong the axis 810 causing radiation to “walk” along the axis 825 thatis across the width of the reflective surface of the blade over thecourse of multiple reflections.

Also the location of the source at the edge 844 also causes theradiation to walk across the mirror along the axis 824. This movement ofthe points of reflection increases the spread of the radiation over thearea of the air path to increase interaction between the radiation andthe air stream.

Alternately the whole width of the blade 810 may be illuminated bysource 820. The radiation path 821 is approximately collinear andcoincident with the air flow path 803. Air between the blade 810 and themirror 822 is exposed to a dose of ultraviolet radiation proportional tothe distance between blade 810 and mirror 822 and the effective numberof reflections given as the sum of amplitudes of each reflection throughthe air volume to be sterilized.

For simplicity of illustration only one blade is illuminated. In someembodiments a plurality of blades spanning the air inlet areilluminated.

Another embodiment is shown again in isometric view at the blades 816and 817, where mirrors 811 and 812 are placed to form an optical cavity842 located between the pair of blades 816 and 817. This can be used asan alternative to the mirror 822 or as an addition to that embodiment.

The mirrors 811 and 812 are separated by a spacing which is effectivelyequal to the blade width 810. Although only one example of the opticalcavity 842 is shown between blades 816 and 817, the embodiment isunderstood to include a similar optical cavity 842 between each pair ofblades 809. In this way, ultraviolet radiation between from a source 813is injected into each optical cavity 842 through a small aperture 814 inthe end mirror 812. Alternately ultraviolet radiation may be injectedinto each optical cavity 842 proximate to the edge of mirror 811 asshown at 815. Preferably the mirrors 811 and 812 are concave and form aconfocal cavity. Preferably the mirrors 811 and 812 are comprised of adielectric material with reflectivity greater than 99% between 250 nmand 280 nm.

As the drum 808 rotates from the intake 802 to output 804, air entrainedbetween each pairs of blades 816 and 817 is irradiated by ultravioletradiation with a dose proportional to the input amplitude from source813 multiplied by an amplification factor.

The amplification factor in each embodiment is related to the mirrorreflectivity as q/(1-r), where q is a factor less than or equal to 1that accounts for optical losses due to geometric effects. For example,a perfect cavity (q=1) and r=99.9% amplifies the radiation from source813 by a factor of 1000 and the required residence time in the radiationfield for a given dose is consequently reduced by a factor of 1000.

FIG. 9 shows a further embodiment generally indicated at 900 of an axialfan arrangement for sterilizing air. The arrangement may be used tosterilize air inline in a HVAC system. Hub 901 with blades 902 rotatesas shown at 904 on axial shaft 903. Light source 905 mounted on hub 901directs ultraviolet radiation at an angle slightly offset from a radialdirection along path 906 toward mirror 907. Preferably light source 905is a LED that includes an integral lens or mirror that operates toreduce the angular divergence of the emitted UV radiation. The angulardivergence is selected such that radiation is confined between concavemirror 907 and hub mirror 909.

The mirror 907 is shaped as a ring centered on the axis of the shaft 903with an inwardly facing concave surface 908. In some embodiments mirror907 corresponds to part of the outer surface of a toroid. In someembodiments the cross section of mirror 907 indicated at 908 has aparabolic shape.

The outer surface of the hub 901 has a reflective surface as shown at909. In some embodiments hub surface 909 is cylindrical. In someembodiments hub surface 909 is concave along the axial direction (notshown). Preferably the reflective surfaces 908 and 909 are dielectricmirrors with reflectivity greater than 99% for wavelengths between 250nm and 280 nm near normal incidence. As shown at 906, radiation isreflected between mirrors 908 and 909 a plurality of times withprogressively advancing angular displacement about axis of shaft 903 soas to form a circular curtain of radiation lying in the radial plane ofthe axis of shaft 903. Air propelled by fan blades 902 passes throughthe curtain of radiation in the axial direction as indicated at 910receiving a dose proportional to the optical amplification factor asdiscussed above and the residence time in the radiation field.

In another embodiment which can be used with the above embodiment or asan addition thereto, shaft 903 has two sets of fan blades axially spacedas shown at hubs 901 and 911 carrying blades 902 and 912 respectivelythereon. As shown fan blades 902 and 912 on the hubs 910 and 911 havereflective facing surfaces and rotate synchronously. These can beangularly aligned as shown or in some embodiments (not shown), thereflective surfaces of the axially spaced fan blades 902 and 912 arealso angularly offset.

The reflective surfaces may be covered with a transparent material suchas fused silica, sapphire or quartz that forms an outer surface of eachblade which is optimized to propel air in the axial direction 910. Thereflective surfaces can therefore be optimized to the light reflectionrather than the air flow. The reflective surfaces may for example bealuminum, however more preferably the reflective surfaces are dielectricmirrors. Ultraviolet radiation emitted by a source 916 mounted on thehub 911 is transmitted between the two fan sets and is reflected backand forth between the fan blades 913 and 912 a plurality of times asshown at 914. Preferably the reflective surfaces of the fan blades areshaped to increase the number of reflections at each radial distancefrom the axis of shaft 903 in proportion to the square of the axialdistance. As the blades rotate through a circle, a cylindrical volumebetween the fan blades is irradiated with ultraviolet radiation withintensity proportional to the optical amplification factor between thefacing blades. Although a single pair of facing reflective blades 902,912 is sufficient to irradiate the entire cylindrical volume spanningthe axial offset, in preferred embodiments all fan blades 902 attachedto a first hub 901 reflect radiation to a respective fan blade 912attached to a second hub 911. In some embodiments the optical cavitybetween the facing blades 902, 912 is arranged by the shape of the bladesurfaces to form a confocal cavity. In some embodiments, the reflectivesurfaces of a combination of blades form a confocal cavity.

In another embodiment which can be used with the above or as analternative, sterilizing ultraviolet radiation is reflected between fanblades 921 and 922 attached to the same hub 911 a plurality of times asindicated by path 923. Fan blades 921 and 922 have reflective surfaces.As the fan blades rotate, the radiation field of path 923 sweeps out adisk and air passing through the disk is irradiated.

Light paths 906, 914, and 923 may be used in any combination. Forexample, axial light paths of type 914 may be combined with angularlight paths of type 922 to form multiple curtains of light sweepingthrough a cylindrical volume between sets of fan blades.

FIG. 10A shows an isometric view of radiation field zones in an air ductgenerally indicated at 1000. The radiation field zones 1001 aregenerally cylindrical volumes within an optical cavity with a highdensity of germicidal ultraviolet photons. The duct volume 1002 containsa plurality of radiation field zones 1001. The fields are defined onlyby concave end mirrors 1007 and 1008 with no intervening walls so thatthe light is only confined by its reflections from the mirrors.

The radiation field zones are arranged in an array such that a straightair flow path along the duct intersects with at least one and preferablymore of the volumes so that the volumes in effect overlap relative tosuch a straight line path such that each air flow path 1003 passesthrough at least one radiation field zone. FIG. 10B shows a top view ofthe arrangement in FIG. 10A. FIG. 10C shows a top view of a preferredarrangement in which the radiation field zones 1001 are hexagonal closepacked in the air duct 1002.

As best seen in FIG. 1 OD, the radiation field zones 1001 are defined bythe interior of a confocal optical cavity. Ultraviolet radiation entersthe cavity from source 1006 through a small aperture (not shown) inconcave end mirror 1007. Concave end mirror 1007 together with concaveend mirror 1008 thus form a confocal optical cavity. End mirrors 1007and 1008 are preferably recessed into the duct walls so as to minimallyinterfere with the air flow. Only the radiation field between the endmirrors indicated at 1009 extends into the air flow region of the duct.End mirrors 1007 and 1008 may be comprised of aluminum with reflectivity92%. Preferably end mirrors are comprised of a dielectric material withreflectivity greater than 99%. The radiation source may for example be aLED. Most preferably the end mirrors 1006 and 1007 have reflectivitygreater than 99.9%. The end mirrors may have a concave sphericalsurface. Most preferably the end mirrors have a concave parabolicprofile so as to maximize the number of reflections between end mirrors1007 and 1008. Increasing the number of reflections amplifies theradiation field produced by the source 1006 alone.

In an embodiment (not shown), the walls of the air duct may be linedwith a transparent material such as fused silica or quartz to present asmooth surface for air flow. However, the reduction in air resistancemust be balanced against optical losses from Fresnel reflection at theadded optical interfaces. That is the reduced energy requirement to moveair must be balanced against the increased energy requirement forradiation sources 1006 due to increased optical losses.

As shown in FIG. 10 A, the radiation field zones are generallyperpendicular to the direction of air flow 1003 in duct 1002. In anotherembodiment (not shown), the axis of the radiation zones may be angled tohave a component in the direction of air flow 1003, thereby increasingthe residence time (and dosage received) of a volume element of air inthe radiation field.

FIG. 11 shows a schematic arrangement for air duct sterilization withmultiple light curtains generally indicated at 1100. Air duct 1101 isbounded by duct walls 1102, 1103, 1104 and 1105. Air flows through duct1101 along the path indicated at 1106, which optionally includes alouver assembly 1129 with louvers 1130 that deflect air flow as shown at1131 into volume 1132. Volume 1132 may for example be a room. Thelouvers 1130 are comprised of an absorbent material and shaped to blockradiation from passing from air duct 1001 to room volume 1132.

Radiation source 1111 directs a collimated germicidal ultravioletradiation beam onto path 1112 reflecting between concave mirrors 1141and 1142 mounted at respective duct walls 1105 and 1104 with a smallangle of incidence along the mirrors. The angle of incidence is set suchthat the distance between successive reflections on the same mirror isless than the radiation beam width, thereby creating a continuouscurtain of radiation. The mirrors at the duct walls are comprised of areflective material. As an alternative, the mirrors are omitted and thereflection is carried out by the walls 1104 and 1105. In this case, theduct walls are comprised of a highly reflective material such as adielectric mirror at locations where the radiation beam intersects aduct wall. Rather than provide a separate mirror, the duct walls 1104and 1105 have a locally defined concave shape acting in the same manneras the mirrors that acts to focus the incident radiation beam and limitangular divergence to the plane of path 1112. As shown at 1113, a mirroris angled to direct the radiation beam from path 1112 toward mirror1114. Mirror 1114 directs the radiation beam onto path 1115, whichzigzags between the duct walls 1004 and 1005. Mirrors 1113 and 1114 arefunctionally equivalent to a periscope and are composed of a highlyreflective material that maximizes radiation transfer from path 1112 topath 1115. The intersection points of path 1115 with duct walls arehighly reflective concave surfaces (not shown). Radiation from path 1115is reflected by mirror 1116 toward a collimation arrangementschematically represented by lenses 1118 and 1120. The collimationarrangement may also be comprised of reflective optical elements (notshown). As indicated at 1117 the radiation beam reflected from mirror1116 is divergent. First optical element 1118 focuses the divergent beamas shown at 1118 and second optical element 120 collimates the radiationbeam as indicated at 1121. The collimated beam is reflected by mirror1123 onto path 1123.

Radiation paths 1112, 1115 and 1123 form three light curtains thatintersect air flowing along path 1106. As shown, the light curtains areperpendicular to the direction of air flow. In a preferred embodiment(not shown), the light curtains are be angled such that a component ofthe radiation beam direction is parallel or anti parallel to thedirection of air flow, thereby increasing the residence time of an airvolume element in the radiation field of each light curtain.

It will be appreciated that there is no intended exit port for thephotons so that the photons remain in the chamber unless they escapethrough unintended openings such as fluid inlet/outlet openings. Asshown in FIG. 7 this unintended escape is reduced or eliminated in thatthere is provided a mirror 750, 751 behind each unintended opening suchas the fluid inlet/outlet openings 725 so as to reflect escaping photonsback into the chamber. Preferably as shown the mirror is a focusingmirror so as to reflect escaping photons back through the opening intothe chamber.

FIG. 12 is a graph showing three separate plots of the effect of opticalamplification relative to a dimension of a source of the radiation whenlocated on one of the mirrors of the opposed mirror arrangements of FIG.1 or FIG. 6. The graph is normalized for focal length of the mirrors:that is the x axis shows values of aperture size divided by focallength. The three plots shown relate to three values of focal length Fdivided by the diameter of the mirror. The conclusion for the threeplots is that, in all cases the transverse dimension of the source whenlocated within the bounds of the mirror surface generally at or adjacentthe center axis of the mirror as shown for example at source 42 in FIG.1, the transverse dimension should be less than 0.03 times the focallength of the mirror and most preferably less than 0.01 times the focallength of the mirror. It will be appreciated that the size or transversedimension of the source can be determined either by selection of asource of the required dimension or my focusing the radiation from alarger source through an aperture of the required dimension.

FIG. 12A shows a schematic cross-sectional view of a prior artdielectric mirror generally indicated at 1200. The dielectric mirrorconsists of a stack of dielectric layers 1201 on a substrate material1203. Although the substrate as shown is flat, the substrate may becurved to produce for example a spherical or parabolic mirror in thearrangements as shown above. The layers 1204 and 1205 are comprised ofhigh refractive index and low refractive index materials, respectively.Refraction and reflection occur at each interface in the stack (notshown). Reflections occur that add constructively contribute to thedielectric mirror reflectivity.

For example, a light ray 1206 entering at first angle of incidence 1207is incident on the dielectric mirror at 1208 and is refracted. Thereflections from the dielectric layers do not satisfy the condition forconstructive interference so the light ray 1206 is transmitted as shownat 1206T.

For example, a light ray 1210 is incident upon the dielectric mirrorwith a second angle of incidence 1211. Due to the different angle, theoptical path lengths through the dielectric layers are combined with thephase change on reflection give a total phase change corresponding tointeger multiples of the light wavelength and the reflected wavesinterfere constructively as shown at 1210R. In commercial mirrors ofthis type, the layer thickness and refractive index are selected tooptimize reflectivity over a predetermined range of wavelength and angleof incidence. Higher reflectivity can be obtained as the designwavelength range or angle of incidence range is narrowed. That isdifferent mirrors are available which are designed to have selectedrange of operation in respect of wavelength and angle of incidence.

In the reaction chamber of the present invention as described in theembodiments above where the angles of incidence change, the opticalamplification obtained is limited by optical losses when actual anglesof incidence fall outside the optimal working range of the mirror. Thedielectric end mirrors shown at 611 and 612 in FIG. 6 are ideallydesigned for near normal incidence. In this case, rays with angles ofincidence above a threshold value of about 45 degrees are transmittedrather than reflected. The reaction chamber should be designed such thatthe angle of incidence does not exceed this threshold. However, highreflectivity over a large range of angles of incidence is desirable tohomogenize the radiation flux within the chamber volume.

FIG. 12B shows schematic cross-sectional view of an improved dielectricmirror generally indicated at 1220. The dielectric mirror is comprisedof a layered stack of dielectric layers 1201, a first surface mirror1202, and a substrate 1203. The order of the substrate and first surfacemirror layers may be interchanged (not shown). The first surface mirror1202 is comprised of any material that is highly reflective in thewavelength region of interest. Suitable choices for the first surfacemirror that cover a wide spectral range are aluminum for UV wavelengths,silver for visible wavelengths and gold for infrared wavelengths. Othermaterials may be used. The first surface mirror 1202 may be a thin layerof reflective material deposited on a substrate material 1203 or thefirst surface mirror may be a block of material thick enough to provideboth reflectivity and mechanical support, in which case the substratelayer 1203 may be omitted.

Three types of dielectric mirror stacks are shown generally indicated at1230, 1240, and 1250.

In dielectric mirror region 1230, the thickness of high refractive indexlayer 1231 and low refractive index layer 1232 are chosen such that theoptical path lengths are odd integral multiples of wavelength/4 for nearnormal angles of incidence giving high reflectivity for small angles ofincidence.

Incident light ray 1233 at first angle of incidence 1207 is outside thedesigned angle of incidence for the mirror and hence is not reflectedbut instead is transmitted (with refraction) through the dielectricstack and is incident upon the first surface mirror 1202 at 1236 withangle of incidence 1235 less than first angle of incidence 1207. Theangle of incidence 1235 at the first surface mirror can be modified bychoice of refractive index of layers 1231 and 1232. The dielectriclayers may be designed such that the most frequently occurring angles ofincidence 1207 correspond to angles of incidence 1235 where firstsurface mirror 1202 has high reflectivity. Put another way, the designshould avoid the angle 1235 corresponding to Brewster's angle for anymode with significant energy. Radiation reflected at the first surfacemirror 1202 is refracted and exits as shown at 1233R. Light ray 1238incident at second angle 1211 is reflected by the dielectric layers dueto constructive interference and exits as light ray 1238R as discussedabove. Hence in region 1230, light rays with a large angle of incidence1207 are transmitted through the dielectric stack and reflected at thefirst surface mirror and light rays with a small angle of incidence 1211are reflected by the dielectric stack.

In dielectric mirror region 1250, the thickness of high refractive indexlayer 1251 and low refractive index layer 1252 are chosen such that theoptical path lengths are odd integral multiples of wavelength/4 forlarge angles of incidence giving high reflectivity for large angles ofincidence. Incident light ray 1233 at first angle of incidence 1207 isreflected by the dielectric stack and exits as light ray 1233R. Lightray 1254 at second angle of incidence 1211 is transmitted by thedielectric stack and is incident on first surface mirror 1202 atlocation 1255 with angle of incidence 1256. Angle of incidence 1256 isless than second angle of incidence 1211 and may be adjusted by designas discussed above. Radiation reflected by first surface mirror 1202 at1255 is refracted and exits as shown at 1254R. Hence in region 1250,light rays with a large angle of incidence 1207 are reflected by thedielectric stack and light rays with a small angle of incidence 1211 arereflected by the first surface mirror.

As illustrated in region 1240, the high refractive index layer 1241 andlow refractive index layer 1242 may have continuously varying thickness.Further, the overall number of dielectric layers in the stack may varywith location. Hence the reflectivity as a function of angle ofincidence will be intermediate between the reflectivity of regions 1230and 1250. With the arrangement of FIG. 12B, the overall reflectivity isgreater than or equal to the reflectivity of the first surface mirrorfor all angles of incidence.

FIG. 13 shows the distribution of angles of incidence for a simulationof the arrangement shown in FIG. 6 wherein the end mirrors 611 and 612are dielectric mirrors and the side walls 610 are a first surfacealuminum mirror. The dashed curve shows the normalized distribution ofangles of incidence on sidewall 610. Small angle reflections below about25 degrees correspond to large angles of incidence at the end mirrorsand are lost to transmission as shown at 1206T in FIG. 12A. Rays withgrazing angles of incidence between 70 degrees and 80 degrees at theside walls correspond to small angles of incidence at the dielectric endmirrors and propagate for hundreds of reflections. The solid line curve1302 shows the normalized distribution of incident angles for asimulation in which all of the surfaces are of the type shown in region1230 of FIG. 12B. All other parameters are the same between the twocases. The distribution of incident angles is more uniform giving a morehomogeneous radiation field in the reaction chamber. The opticalamplification is more than 2× higher for the arrangement 1230. Use ofthe composite mirror arrangement permits more favorable choices forradiation source parameters leading to a gain in optical amplificationof more than 8×.

FIG. 14 is a perspective view of a sports helmet with an integralsterilization chamber indicated generally at 1400. The sterilizationchamber provides a stream of sterile air to the athlete wearing thehelmet. The sports helmet consists of three main units: helmet body1401, face shield 1402, and sterilization unit 1403. The sterilizationunit may be an appendage such as a crest on the helmet body as shown. Inan alternate embodiment (not shown), the sterilization unit may beenclosed within the helmet body. In an alternate embodiment (not shown),the sterilization unit may be mounted on the face shield, generally atthe level of the nose, mouth, or neck of the wearer. The sterilizationunit 1403 has similar form and function to the arrangements shown inFIG. 1 and FIG. 6. For brevity only the major components are shownschematically. Fan 1411 draws non-sterile air though a vent 1410 in theback of the helmet body 1401 generally in the direction from posteriorto anterior as indicated at 1412. The non-sterile air enterssterilization chamber 1413 and flows through the sterilization chamberas indicated at 1414 in the presence of a UV radiation field whichsterilizes the air as discussed previously for FIG. 1 and FIG. 6. Thepath through the sterilization chamber 1413 may be tortuous. In someembodiments, sterile air is directed though an aperture 1415 proximateto the top of the face shield 1402 in the direction indicated at 1416.In this embodiment sterile air flows generally across the face from theforehead toward the chin and is constrained to the vicinity of the faceby the face shield. Air exhaled by the athlete together with remainingsterile air is expelled at the bottom of the face shield as shown at1420. This embodiment has the additional benefit of providing coolingair across the entire face to the athlete. The fan 1411 generatespositive air pressure between the face of the athlete and the faceshield preventing non-sterile air from flowing into the facial region atthe bottom of the face shield. That is the fan supplies a flow ofsterilized air that is sufficient for both respiration and to displacenon-sterile air at the bottom of the face shield.

In an alternate embodiment, sterile air is directed through a tube 1417to a nozzle 1418 which directs a sterile air stream toward the nose andmouth region for respiration as indicated at 1420. The direction ofnozzle 1418 is adjustable so that the athlete can aim air flow in adirection suited to the athlete's physiology. The sterilization unitincludes a control unit 1421 and a power supply 1422 which perform thesame functions as discussed for FIG. 1. Optionally the sterilizationunit may include an air cooler shown schematically at 1423, which mayfor example be a thermo-electric cooler.

In an alternative embodiment (not shown), the helmet body 1401 is a hat,head band or balaclava without a face shield 1402. Nozzle 1418 isattached to the hat, headband or balaclava and directs sterilized airtoward the mouth and nose region of the hat, headband or balaclavawearer's face. That is the hat, headband or balaclava providesstructural support for the nozzle. The sterilization unit 1403 may beintegral with the hat, headband or balaclava or worn on the personseparately. Tube 1417 connects the sterilization unit with the nozzle.

In an embodiment that can be used with any of the following or precedingembodiments, the reaction chamber is comprised of a deformable material.The deformable material may for example be a malleable metal, rubber,plastic, foam, fabric, composite, liquid, or other suitable deformablematerial. In some embodiments, the deformable material is deformed by anexternal force and returns to its original shape when the external forceis removed. For example, the deformable mirror may be used to form asterilization chamber in a sports helmet that is subject to impactforces. In some embodiments, the deformable material does not return toits original shape. For example, a fabric may be used to form asterilization chamber that can be collapsed for transport.

FIG. 15 shows cross sectional view of a deformable mirror generallyindicated at 1510. The mirror is comprised of a deformable substratematerial 1501 with deformable surface 1514 coated with a one or morelayers of micro-mirrors. In some embodiments a first surface layer 1502is comprised of first surface micro-mirrors 1511 and a second layer 1503is comprised of dielectric micro-mirrors 1512. In this arrangement thedielectric micro-mirrors 1512 reflect light incident within a firstrange of angles and the first surface micro-mirrors 1511 reflect lightincident at angles outside of said first range of angles and light thatpasses through gaps between micro-mirrors in the top layer 1503. In someembodiments, a deformable surface is covered with one or more layers ofcomposite dielectric micro-mirrors 1513. The composite dielectricmicro-mirrors may be of the type shown in FIG. 12B in which a stack ofdielectric layers 1201 overlays a first surface mirror 1202. In thisembodiment, the micro-mirrors 1513 are preferentially oriented suchincident radiation is incident on the dielectric stack first. Mostpreferably the composite dielectric micro-mirrors 1513 are of the typeshown in expanded view at 1504. The composite dielectric micro-mirror1504 is comprised of a first surface mirror layer 1516 positionedbetween a first stack of dielectric layers 1515 and a second stack ofdielectric layers 1517. The micro-mirror 1504 does not need to beoriented as dielectric layers 1515 face incident radiation in a firstpreferred orientation and dielectric layers 1517 face incident radiationin a second preferred orientation. The dielectric stacks 1512, 1515 and1517 are comprised of alternating layers of high refractive indexmaterial 1518 and low refractive index material 1519. In someembodiments micro-mirrors of type 1511, 1512 or 1513 are attached todeformable surface 1514 by electrostatic forces. In some embodimentsmicro-mirrors of type 1511, 1512 or 1513 are attached to deformablesurface 1514 with an adhesive 1505. In some embodiments micro-mirrors oftype 1511, 1512 or 1513 are embedded in a layer of deformabletransparent material 1506. The thin layer of deformable transparentmaterial may for example be a polymer material. The micro-mirrors mayfor example be applied to deformable surface 1514 as in ink comprised ofmicro-mirrors 1511, 1512, or 1513 and a solution comprised of a solventand a polymer material.

The micro-mirrors 1511, 1512, and 1513 have a generally planar shapewherein the linear dimension of the micro-mirror 1507 is much greaterthan the thickness 1508. For example, the aspect ratio may be 10:1 ormore. The linear dimension may for example be in the range of 10 micronsto 2000 microns. Because of the high aspect ratio, the micro-mirrorswill tend to align parallel to the local plane of the deformablesubstrate material 1501 to minimize potential energy. The lineardimension 1507 is chosen to limit the mechanical stress on themicro-mirrors with deformation of surface 1514 to a stress below theyield point of the micro-mirror materials: that is the micro-mirror doesnot fracture. The gaps between micro-mirrors serve to relieve mechanicalstress. In some embodiments the micro-mirrors are irregularly shapedflakes. In preferred embodiments, the micro-mirrors have regular shapesthat form a space filling array: that is the space between adjacentmicro-mirrors is minimized. For example the micro-mirrors may have theshape of hexagonal plates. In some embodiments, a plurality ofmicro-mirror sizes is used to form a space filling array. In someembodiments a plurality of micro-mirror layers are applied to deformablesurface 1514 such that the reflective portions of micro-mirrors in a toplayer overlay gaps between micro-mirrors in a bottom layer. In someembodiments the micro-mirrors are placed on the deformable surface withrandom centers, for example if the micro-mirrors are applied as an ink.In some embodiments the micro-mirrors are assembled in a self-assemblingLangmuir-Blodgett film and the Langmuir-Blodgett film is applied to thedeformable surface 1514. In some embodiments the micro-mirrors areapplied to the deformable surface 1514 as arrays on a sheet joined withthin bridges of connecting material and the thin bridges aresubsequently fractured or removed. In some embodiments the micro-mirrorsare individually placed and attached to the deformable surface 1514.

FIG. 15B shows a schematic cross-sectional view of a deformable scalemirror array generally indicated at 1520. Mirror plates 1521 arearranged at quasi-regular intervals along a flexible connecting member1522 in the general chain direction indicated at 1527. The intervals arechosen such that the mirror plates overlap and present a continuousreflective surface to radiation incident at all but grazing angles ofincidence near the chain direction 1527. Flexible connecting member 1522may for example be a wire or a fiber. In some embodiments mirror plate1521 is comprised of substrate material 1524 and dielectric stack 1525.Substrate 1524 may have an aperture 1523, which functions as a point ofconnection between successive mirror plates: that is connecting member1522 passes through aperture 1523. Aperture 1523 has a diameter largerthan the diameter of connecting member 1522 allowing a limited range oftranslation and angular displacement of mirror plates 1521. Connectingmembers 1522 may form a two-dimensional surface. For example connectingmembers 1522 may be arranged in a rectangular or hexagonal grid withcross connecting members indicated at 1526. Cross members 1526 serve tolimit the range of linear displacement of mirror plates 1521. Hence, asthe web of connecting members deforms, the collective shape of themirror formed by mirror plates deforms. In some embodiments the mirrorplates are comprised substantially of a single material that forms botha base and a first surface mirror as indicated at 1526. The material mayfor example be a reflective metal such as aluminum, silver or gold,which may also include a protective layer of transparent material. In apreferred embodiment, substrate 1524 forms a first surface mirror and iscovered with a dielectric mirror 1525. The composite mirror functions asdiscussed with reference to FIG. 12B.

FIG. 15D is a schematic cross-sectional view of a deformable mirrorcomprised on an ordered array of mirrors generally indicated at 1530.The deformable mirror consists of a deformable substrate material 1531and at least two types of mirrors 1532 and 1533 that differ in thelength of attachment member 1534. Mirrors 1532 and 1533 are arranged ona periodic lattice such that the reflective surfaces of mirrors of type1533 overlap the reflective surfaces of mirrors of type 1532. Mirrors oftype 1533 preferably reflect most incident radiation and mirrors of type1532 reflect radiation that passes through gaps between mirrors of type1533. The gap size and length of attachment member 1534 are selected toallow a specified range of angular displacement to a user. The range ofangular displacement is in turn determined by the maximum surfacecurvature permitted by substrate material 1531. Attachment member 1534of both types is firmly attached to deformable substrate 1531 and allowsangular, but not translational displacement of mirrors 1532 and 1533relative to the substrate material. Deformation of the substratematerial may cause small changes in the periodicity of the mirrors 1532and 1533 relative to a fixed frame of reference. In some embodiments,the mirrors 1532 and 1533 are comprised of a single material that alsoforms a front surface mirror with normal approximately perpendicular tothe deformable substrate surface as shown at 1538. In preferredembodiment mirrors 1532 and 1533 consist of an attachment member 1534,base 1535 that also functions as a front surface mirror, and dielectricmirror 1537. Optionally dielectric mirror 1537 is encased in a frontsurface mirror as shown at 1536. Front surface mirror 1536 functions toprevent radiation from entering dielectric mirror 1537 through the sideof the dielectric stack. As shown at 1539, the mirror surface may beconvex. This feature may be used in a reaction chamber to make theradiation field more homogeneous. As shown at 1540, the mirror surfacemay be concave. This feature is particularly useful for focusingradiation incident on mirrors of type 1532 through the gap betweenmirrors of type 1533. In some embodiments, the mirror angulardisplacements are determined by deformation of the substrate 1531. Insome embodiments the mirror angular displacements are determined atleast in part by an electro-mechanical actuator. For example, themirrors may form an electro-mechanical micro-mirror array with twooverlapping layers. The addition of a second layer increases the opticalefficiency of the array.

FIG. 16A is a schematic view of a portable sterilization chamberconfigured for transport generally indicated at 1600. The majorcomponents of the portable sterilization chamber are a utility module1625 and a sterilization volume 1611. The utility module includes a fan1601 that draws air into the system, an electronic control module 1602that includes the functionality described previously for control 4 inFIG. 1, and a power supply 1603. Power supply 1603 may for example be arechargeable battery. Utility module 1625 is connected with UV radiationsource 1604. UV radiation source may for example be a LED. UV radiationis emitted into cavity 1605 which is shaped to and formed to control theangular distribution of radiation emitted into sterilization volume1611. That is the angular distribution of the emitted radiation iscontrolled such that the dominant emission angles correspond with anglesof highest reflectivity of the deformable reflective material. Utilitymodule 1625 is in communication with sensor module 1607. Sensor module1607 is operable to measure UV radiation field amplitude and optionallythe temperature, humidity, and particulate concentration of air insterilization volume 1611. Air to be sterilized is directed along duct1606 from fan input 1601 to sterilization volume 1611. Sterilizationvolume 1611 is bounded by end mirrors 1608 and 1609 and by deformablereflective material 1610A. In some embodiments end mirrors 1608 and 1609are comprised of a deformable reflective material. The deformablereflective material may for example be selected from the arrangementsdescribed in FIGS. 15 to 15E. As shown, the deformable reflectivematerial is folded to reduce the size of the apparatus for transport orstorage.

FIG. 16B shows a schematic view of a portable sterilization chamberconfigured for operation indicated generally at 1620. This arrangementis similar to the arrangement in FIG. 16A, except that the deformablereflective material is extended as indicated at 1610B. In someembodiments deformable reflective material 1610B is inflated and shapedby air pressure from fan 1601. The extended shape of the deformablereflective material may for example be approximately cylindrical. Theextended shape of the deformable reflective material may for example beapproximately rectangular. As shown, the surface shape of the deformablereflective material does not need to be smooth to be functional. Thehigh reflectivity conferred by the arrangements in FIGS. 15 to 15E ismore important than surface smoothness. The efficiency of thearrangement can be increased by increasing the distance between the endmirrors 1608 and 1609. Sterilized air is expelled through vent 1612.Vent 1612 may for example be connected with a mask for respiration.

FIG. 16C shows a schematic view of a portable sterilization chamber witha flexible hollow light pipe generally indicated at 1640. Thearrangement in FIG. 16C is similar to the arrangement in FIG. 16B,except that sterilization volume is bounded by hollow flexible lightpipe 1613 with exit 1614. Light pipe 1613 may be coiled as shown toreduce the size of the apparatus. UV radiation propagates concurrentwith air along the length of the light pipe. The light pipe may forexample have a length of more than 10 meters. Preferably the light pipehas a length of about 50 meters.

FIG. 17A shows a side view of a further embodiment of a reaction chamberaccording to the current invention generally indicated at 1701. Thereaction chamber has reaction volume 1703 enclosed by concave mirrors1704 and 1705 and optional side mirror 1706. Optionally mirrors 1704,1705 and 1706 may be protected by a window comprised of a transparentmaterial as shown schematically at 1709. Optional side mirror may forexample have a generally cylindrical shape, possibly with regionsremoved to allow passage of sample material into or out of reactionvolume 1703. Optional side mirror may for example consist of a pluralityof reflective sections arranged parallel and displaced from reactionchamber axis 1722 to form a generally polygonal shape. Preferably thepolygon has an odd number of sides. Preferably the number of polygonsides is greater than eight. As shown there is an optional gap 1713between concave mirror 1705 and side mirror 1706. Gap 1713 may forexample be an annular ring abutting the entire edge of concave mirror1705. Alternately gap regions 1713 may abut only selected portions ofthe edge of concave mirror 1705 wherein the gap regions are selected tocorrespond with minima in incident flux.

As best seen in FIG. 18B, the flux density for radiation sources has thesymmetry of the radiation sources and mirror images thereof. Hence thegap regions are preferably centered intermediate between symmetry axesof the flux density.

Optionally secondary mirror 1707 is positioned proximate to gap 1713 andshaped to reflect flux passing from reaction volume 1703 through gap1713 back into reaction volume 1703. As illustrated at 1723, a raypasses through gap 1713 and is reflected by secondary mirror back intoreaction volume 1703. Preferably secondary mirror 1707 has a generallyconcave shape with respect to any direction perpendicular to chamberaxis 1722 and reflects incident rays to a focal point 1724 withinreaction volume 1703. The concave shape may be an arc segment of acircle. Preferably the concave shape is parabolic. The solid of rotationfor the concave profile is a semi-toroidal shape. The extent of thesemi-toroid secondary mirror matches, or slightly exceeds the extent ofgap 1713. As shown at 1707, the secondary mirror has a ring shape. Asshown at 1708, the secondary mirror extends only part way around theperimeter proximate to concave mirror 1705. As shown at 1711, there maybe a gap between secondary mirror 1708 and edge mirror 1711. As shown at1712, there may be a gap between secondary mirror 1708 and concavemirror 1705. At least one gap 1711 or 1712 is required for the passageof sample material through gap 1712. A transparent material may beplaced proximate to gap 1712 to guide the flow of sample material asshown at 1714 and 1716. In some embodiments the transparent materialforms a conduit 1715 wherein sample material enters through region 1715Aand exits through region 1715B.

As best shown in FIG. 17B, conduit 1715 may follow any path throughreaction volume 1703. Conduit 1715 may for example have a generallyspiral shape to increase the residence time of sample material withinreaction volume 1703. Conduit 1715 may for example terminate near thecenter of reaction volume 1703 and sample material deposited proximateto the center moves radially outward toward gaps 1712. As best shown at1718B, gaps 1711 and 1712 may be enclosed by walls 1719A and 1719B toform external exit conduit 1718B continuous with conduit 1715B. As bestseen in FIG. 17B, conduit region 1715A is continuous with external inputconduit 1718A.

Reaction chamber 1701 includes one or more radiation input ports asshown at 1720 and 1721. Preferably there are two or more input radiationports to provide a more homogenous radiation field within reactionvolume 1703. Preferably the radiation input ports are arranged atregular angular increments about reaction chamber axis 1722. Note thatin the example shown the radiation pattern within reaction volume 1703has inversion symmetry such that the two sources 1720 and 1721 withangular displacement 90 degrees produce a 4-fold symmetry axis as bestseen in FIG. 18B. Radiation sources 1720 and 1721 preferably emitradiation distributions with axis parallel to reaction chamber axis1722. As shown at 1720R and 1721R, a majority of the radiation emittedis within a cone with axis parallel to chamber axis. Preferably the fullcone angle of radiation emitted from sources 1720 and 1721 is 60 degreesor less. More preferably the full cone angle of radiation emitted fromsources 1720 and 1721 is 30 degrees or less. The collimation ofradiation causes radiation to travel primarily back and forth betweenconcave mirrors 1704 and 1705.

Sources 1720 and 1721 absorb incident radiation flux and consequently itis advantageous to minimize the area of each source. Preferably theradiation sources 1720 and 1721 include an aperture opening intoreaction volume 1703 wherein the diameter of the aperture opening is 1mm or less. Collimating the input radiation through an aperture may beaccomplished by placing one or more optical elements (such as lenses)between an emitter and the aperture as described in more detail below.Further, absorption by radiation sources is minimized by radiallydisplacing radiation sources 1720 and 1721 from chamber axis 1722. Asthe radial displacement is increased, the advantage of reducedabsorption is offset by increased loss at gaps 1713. Empirically theinventors discovered that the radial displacement is preferably in therange of 0.5 to 0.75 times the radius of concave mirror 1704. Mostpreferably the radial displacement is 0.62 times the radius of concavemirror 1704. Note that the radius here is half of the diameter of themirror and not the radius of curvature. Rays reflected many timesprimarily between concave mirrors 1704 and 1705 form a sequence of raysegments that are displaced one from the next and nearly parallel (oranti-parallel). The radiation field so produced is highly directionaland best described by an order parameter S=0.5*<3*cos(theta)−1>, wheretheta is the angle between each ray and chamber axis 1722 and the anglebrackets signify an average over all rays. The order parameter S sodefined is widely used in the art to describe for example the alignmentof liquid crystals. Whereas prior art describes reaction chambers withdirectionally isotropic radiation fields (S<0.2), the present inventiondescribes a reaction chamber with a highly directional radiation field.The degree of optical amplification correlates with the order parameter.Preferably the order parameter of the radiation field in the reactionchamber of the present invention is more than 0.3. More preferably theorder parameter of the radiation field in the reaction chamber of thepresent invention is more than 0.5. Most preferably the order parameterof the radiation field in the reaction chamber of the present inventionis more than 0.7.

Mirrors 1704, 1705, 1706, 1707 and 1708 may for example be metallicmirrors with a protective coating to prevent oxidation. The preferredmetals for the UV and visible ranges are aluminum and silver,respectively. Preferably mirrors 1704, 1705, 1706, 1707 and 1708 aredielectric mirrors with reflectivity optimized for design wavelength andangle of incidence ranges. The design wavelength range is determined bythe type of photochemical reaction desired. For example, the optimaldesign wavelength range is between 255 nm and 275 nm for inactivation ofbacteria and viruses. The design angle of incidence for each mirror orregion thereof is selected to include a majority of the incident flux.In the example shown in FIG. 17A, the majority of flux incident onconcave mirror 1704 is incident at angles between 0 and 20 degrees andhence the reflectivity of concave mirror 1704 is optimized for angles ofincidence between 0 and 20 degrees. In the example shown in FIG. 17A,the majority of flux incident on optional side mirror 1706 is incidentat angles between 60 degrees and 80 degrees and hence the reflectivityof side mirror 1706 is optimized for angles of incidence between 60degrees and 80 degrees. Mirrors 1704, 1705, 1706, 1707 and 1708 may beany combination of metallic and dielectric mirrors.

FIGS. 18A, 18B and 18C show sequences of slices through reaction chamber1701 perpendicular to chamber axis 1722 as shown at 1725. The chambergeometry is identical in each simulation.

FIG. 18A illustrates the radiation field obtained using a prior artdiffuse reflector with reflectance 0.97. The radiation field is clearlystronger in proximity to the two emitters. The example shown in FIG. 18Afeatures sources that are not collimated (Lambertian) as prior art citesthis distribution as most advantageous. The order parameter for theradiation field in FIG. 18A is 0.0.

FIG. 18B shows the radiation field for a reaction chamber with allaluminum mirrors. This simulation best shows the symmetry of theradiation field in the present invention. The order parameter is 0.67.The average radiation moment of the Teflon chamber 18A and aluminumchamber 18B is the same (169) in both cases. That is radiation intensitytimes the interaction distance is the same. Hence the overalleffectiveness is about the same despite the lower average reflectivityof aluminum (0.92 vs 0.97 for Teflon). That is the geometricaladvantages of the present arrangement are sufficient to overcome thelower reflectivity of aluminum. FIG. 18C shows the radiation field in apreferred embodiment of the invention using dielectric reflectors on allsurfaces. The order parameter is 0.67 and the average moment is 2397, animprovement of more than 14× over prior art.

The concave mirrors 1704 and 1705 may be comprised of dielectric stacksoptimized for UV reflectivity as shown in the reflectivity vs wavelengthplot shown in FIG. 19. As seen in FIG. 19, the dielectric stack haswindows of near transparency centered near 400 nm, 530 nm and 800 nm.Probe radiation source 1730 may emit probe radiation as shown at 1731within these spectral windows to interact with sample material and theinteraction radiation is detected at detector 1732. For example source1730 may emit radiation from a commercial LED source at 405 nm andfluorescence from within reaction volume 1703 is detected near 530 nm bydetector 1732. For example source 1730 may be an argon laser emittingradiation at 514.5 nm and Raman scattered radiation from sample materialin reaction volume 1703 is measured by detector 1732, in this case aspectrometer.

FIG. 20A shows an enlarged schematic side view of an arrangement to emitradiation from a surface mount LED through an aperture generallyindicated at 2001. The drawing is not to scale and is intended to conveythe design ideas. This arrangement may be used as the emitters 1720 and1721 shown schematically in FIG. 17A. Dielectric mirror 2002 consists ofa plurality of alternating layers of low refractive index material 2003and high refractive index material 2004 on a substrate material 2005.The dielectric mirror has a small hole 2007 with a stepped profileconsisting of sections 2008, 2009 and 2010. Section 2008 is a smallaperture in the dielectric mirror top surface 2006. Aperture 2008 has adiameter slightly smaller than the diameter of lens 2015. Preferably thediameter of aperture is less than 1 mm. In section 2009 the edge of thehole is angled such that the hole diameter increases with distance frommirror top surface 2006. The angled profile retains and centers lens2015 on aperture 2008. Lens 2015 may for example be a quartz ball lens.Hole region 2010 has a flat upper surface 2011 and has diameter slightlylarger than the diagonal size of surface mount LED 2020. Surface mountLED may for example be 3.5 mm×3.5 mm requiring hole region to havediameter 5 mm or larger to leave a gap 2012 between the edge of the holeregion 2010 and surface mount LED 2020. Lens 2015 is retained in region2009 by ring 2014 with central hole slightly smaller than the diameterof lens 2015. The upper edge of ring 2014 is retained by upper surface2011 of hole region 2010 and the lower edge of ring 2014 is retained bya spacer 2013. The spacer 2013 is a ring with inner diameter selectedsuch that the lower surface does not contact electronic components onLED 2020. Spacer 2013 functions to provide a small gap 2023 betweenemitter 2021 of LED 2020 and the bottom surface of lens 2015. The gap isselected such that rays 2024 from emitter 2021 are refracted by lens2015 as shown at 2025 so as to pass through aperture 2008 leastpartially collimated as shown at 2026. The gap 2023 is typically lessthan 1 mm and preferably between 0.1 and 0.2 mm. LED emitter 2021 ismounted on and electrically connected with surface mount package 2020which has integral anode, cathode and heat sink pads (not shown)electrically connected with printed circuit board 2022.

FIG. 20B and FIG. 20C show side and top views of arrangements for LEDemitters embedded in a dielectric mirror. There are three arrangementsof optical components and three arrangements of electrical connections.Any of the optical arrangements may be used with any of the electricalarrangements giving a total of nine possible combinations. Thearrangements shown in FIGS. 20B and 20C may be the radiation emittersshown at 1720 and 1721 in FIG. 17A. Number labels that coincide withlabels in FIG. 20A have the same meanings.

The first optical and electrical arrangements are shown schematically at2030. Substrate layer 2005 is shown flat in the schematic and is closeto flat on the scale shown. However on a larger scale substrate layer2005 may take the shapes of mirrors 1704, 1705, 1706, 1707 or 1708 inFIG. 17A. Substrate layer may be comprised of a metal, plastic, ceramic,glass or other suitable material shaped to the mirror forms. Substrate2005 may optionally be covered with electrically insulating layer 2035if the substrate material is electrically conductive. Insulating layer2035 may be overlaid by conductive layer 2034 in electrical contact witha first surface of light emitting diode crystal 2031. Conductive layer2034 is electrically isolated from conductive layer 2032 by insulatinglayer 2033. Conductive layer is in electrical contact with a secondsurface of light emitting diode crystal 2031. Hence when a voltagedifference is applied between conductive layers 2032 and 2034,electrical current may pass through light emitting diode crystal 2031and excite emission of electromagnetic radiation. As shown micro lens2036 is positioned immediately above light emitting diode crystal 2031in well 2037 and functions to reduce the angular divergence ofelectromagnetic radiation emitted by the embedded light emitting diode.

The second optical and electrical arrangements are shown schematicallyat 2040. In this arrangement there is only one electrically conductivelayer 2034 overlaid on insulating layer 2035. Electrically conductivelayer 2034 is patterned with a network of conductive strips analogous toa printed circuit board, except that the conductive traces are laid overand follow the contours of optical substrate 2005. The anode and cathodeof light emitting diode crystal 2041 are connected to separateconductive traces 2042 and 2043. When a voltage is applied acrossconductive traces 2042 and 2043, light emitting diode crystal emitselectromagnetic radiation into integral micro lens 2044 embedded indielectric mirror 2002. Micro lens 2044 functions to at least partlycollimate electromagnetic radiation emitted from the surface ofdielectric mirror 2002.

The third optical and electrical arrangements are shown schematically at2040. In this arrangement the light emitting diode crystal 2051 isembedded in an insulating layer 2033 with no overlaying dielectriclayers. The anode and cathode of light emitting diode 2051 are connectedto wires 2052 and 2053, respectively that pass through substrate 2005 toexternal circuitry. In this arrangement, radiation is emitted with awide angular divergence.

FIG. 21A shows a scale drawing of a prior art LED mount on a substrategenerally indicated at 2101. FIG. 21B shows a scale drawing of LED lightsources embedded in a dielectric mirror according to the presentinvention generally indicated at 2102. The scale of FIGS. 21A and 21Bare the same. In FIG. 21A surface mount LED 2111 with light emittingarea 2112 is attached to substrate 2110 and electrically connected toexternal circuitry by wires 2113 and 2114. The package of surface mountLED 2111 (3.5 mm×3.5 mm) is 19.1× larger than the emitting area (0.8mm×0.8 mm). The LED emitting area 2112 absorbs incident radiation andthe remaining package area is either absorbing or poorly reflective,depending on the choice of commercial LED. The intensity of radiationincident on the package area of surface mount LED 2112 and the areas ofwires 2113 and 2114 is attenuated. The maximum driving current and henceradiant output of light emitting area 2112 is determined by the capacityof a heat sink (not shown) to maintain device 2112 below a thresholdtemperature.

In the mounting scheme of the present invention shown in FIG. 21B lightemitting crystal regions 2122, 2124, 2126, and 2128 are embedded indielectric mirror 2120 and arranged symmetrically about dielectricmirror axis 2129 as illustrated in FIG. 20B. The symmetrical arrangementimproves the homogeneity of the radiation field in the reaction chamber.As shown, the radial distance from the axis of the LED regions indicatedat 2130 is 0.62R, where R is the radius of dielectric mirror 2120.Regions 2122, 2124, 2226, and 2128 are overlain by micro lens 2121,2123, 2125, and 2127, respectively. The micro lens function to reducethe angular divergence of radiation emitted by light emitting regions2122, 2124, 2126, and 2128. The reduction in angular divergenceincreases the order parameter and amplification factor of the reactionchamber. As shown the emitting areas are square and the lenses arecircular with diameter equal to the diagonal of the square emittingareas. These geometries are commercially available. However circularemitting areas are preferred. The total lens area is 10% of the area ofthe surface mount LED package 2111 and hence the absorption of incidentradiation is reduced by a factor of 10 as compared with prior art. Thechoice of four emitting areas is for illustrative purposes only. Thegeneral concept of the invention is to divide a given emitting area intoa plurality N portions where N is any integer greater than or equal to2. The total area of light emitting crystal is the same as shown in FIG.21A, but the area is divided into four equal portions 2122, 2124, 2126,and 2128. This has the beneficial effect of reducing the heat load by afactor of approximately four. Because there is more surface area forheat dissipation LED regions 2122, 2124, 2126, and 2128 can be run at aslightly higher current density than LED region 2112 giving higher totalradiant flux. As best seen in FIG. 20B, the electrical connections toLED regions 2122, 2124, 2126, and 2128 are beneath dielectric mirrorlayers and hence do not contribute to absorption of incident flux.Preferably LED regions 2122, 2124, 2126, and 2128 are electricallyconnected in series, which has the beneficial effect of stabilizing theelectric current and balancing the radiant output of the LED regions,again improving the homogeneity of the radiation field in the reactionchamber.

Turning now to FIG. 22 there is shown a reaction chamber 22A of a typegenerally as described above. In this case the chamber 22A is formed byreflective surfaces 22B and 22C where surface 22B is concave and surface22C is flat. As long as surface 22B is concave, any inaccuracies in theorientation of or plane of the flat mirror 22C do not interfere with therequired back and forth reflections that are required. As before, thereflective surfaces 22B and 22C are preferably high reflectivitydielectric mirrors. The side surfaces can be comprised of a reflectivematerial which may be a dielectric or a lower cost, lower reflectivitymaterial. The reaction chamber is shaped such that the side wallsreceive less radiation intensity per unit area than the surfaces on theoptical axis. Hence lower reflectivity at the side walls has a smallereffect on overall optical gain than lower reflectivity of surfaces alongthe optical axis. The highest optical gain is realized if all surfacesare high reflectivity dielectric mirrors.

The surfaces 22B and 22C generate a center optical axis 22D at rightangles to the surfaces and centered on the center of the concave surface22B.

In this embodiment there is provided a reflective surface or otherredirecting surface 22E part way along the axis 22D to form a secondaxis portion at an angle to the first so that instead of the axis 22Dforming a single straight line, it is formed into two sectors orportions at an angle. The second portion 22F cooperates with a secondconcave mirror 22G.

The figure also shows a number of different alternatives for thelocation and arrangement of one or more sources of the radiation anddifferent transfer arrangements for carrying the radiation to a requiredlocation within the reaction chamber.

Thus at 22H is shown a first possible source which is located externalto the chamber and includes a collimation system 221 so that theradiation from the source is carried to the external wall of the chamberand passes through a limiting orifice 22J to enter the chamber at aposition offset from the axis 22D as previously described.

A further source of the same construction is located at 22L which can beused as an alternative to or as an addition to the source 22H. Source22L is located on the flat surface 22C and the latter is located on theconcave surface.

As a further alternative, an external source 22K directs radiationthrough its orifice 22J on one of the side surfaces of the chamber ontoa redirecting body 22M carried on a support 22N which redirects theradiation onto the path parallel to but offset from the axis 22D.Preferably support 22N is comprised of a transparent material.

At 22P is provided a further alternative source which in this case islocated inside the chamber and carried on mounting support 22Q. Thesource 22P is located inside a mirrored contained forming a cube withsix mirrored surfaces so that the radiation from the source inside thecube is released into the chamber through a small orifice 22J but isthen reflected by the external walls of the cube to be retained withinthe chamber to pass through the multitude of reflective paths asdescribed above.

A yet further alternative is shown at 22R where the source is externaland the radiation is carried by a rigid or flexible light pipe such as afiber optic 22S to a reflective surface 22T causing the radiation toturn to the required direction parallel to the axis 22D.

In another arrangement, not shown, the source can be a radiantcylindrical tube located within the chamber preferably at an orientationparallel to the optical axis but optionally at other orientations suchas right angle to the axis. If parallel to the axis, the tube can belocated on the axis or spaced outwardly from the axis. The preferred oroptimum position locates the tube at a spacing from the axis of one halfof the radius of the concave surface.

In another arrangement not shown, the concave mirror can be formed witha central section at the axis which is a dielectric mirror and on outerring of a material of reduced reflectivity such as polished aluminum.While this of course reduces the total efficiency of reflections and themaximum increase in paths due to the lower reflectivity of the outerring of material, this may be more suitable in some circumstances forreduced cost and bearing in mind that the majority of the increase inpaths is generated adjacent the center or axis of the concave mirrorwith a reduced effect oat outwardly spaced locations. Thus anarrangement of best efficiently/cost can be produced by selecting thesizes of the surfaces and the proportion of the central area which isformed of the dielectric mirror.

1. A method for applying electromagnetic radiation to reactant materialsin a reaction chamber comprising: introducing the electromagneticradiation into the chamber; and increasing the probability ofinteraction of the electromagnetic radiation with the reactant materialsby using multiple reflections to increase the optical path length of theelectromagnetic radiation through the reaction chamber; wherein thereaction chamber includes two opposing reflective surfaces of thechamber arranged to cause reflections of the electromagnetic radiationback and forth within a volume between the reflective surfaces; whereinat least one of the reflective surfaces is a concave mirror.
 2. Themethod according to claim 1 wherein at least one reflective surface ofthe reaction chamber comprises a dielectric mirror with reflectivity atthe selected wavelengths greater than 99%.
 3. The method according toclaim 1 wherein a majority of radiation paths include at least ten andpreferably more than one hundred reflections.
 4. The method according toclaim 1 wherein there is provided a further reflective surface betweenthe two reflective surfaces.
 5. The method according to claim 1 whereinthe further reflective mirror surface is metallic.
 6. The methodaccording to claim 1 wherein the reflective surfaces define at least onecenter optical axis extending therebetween along which the reflectionspass and wherein the source is located at a position offset from thecenter axis between the reflective surfaces so that a locus of thereflections moves toward the center axis.
 7. The method according toclaim 1 wherein the source is located at one side of said at least oneconcave mirror.
 8. The method according to claim 1 wherein the source islocated at a position on said at least one concave mirror and whereinthe source has a dimension which is less than 0.03 times the focallength of the mirror.
 9. The method according to claim 1 wherein theoffset between each beam and a next beam after a reflection is less thana width of the beam so that the beams form a complete curtain.
 10. Themethod according to claim 1 wherein there is provided an inlet port foradmitting reactive materials and an outlet port for discharging productmaterials and wherein there is provided absorbing surfaces formed andshaped to stop transmission of electromagnetic radiation from theinterior of the chamber to an exterior location.
 11. The methodaccording to claim 1 wherein the inlet and outlet ports are not on anaxis of symmetry of the reaction chamber.
 12. The method according toclaim 1 wherein at least part of a chamber wall reflects electromagneticradiation diffusely.
 13. The method according to claim 1 including usinga further electromagnetic radiation to obtain information relating tothe reactant materials where the further electromagnetic radiation has afurther wavelength different from said wavelength at which thedielectric mirror reflects the electromagnetic radiation at thewavelength at a second lower percentage.
 14. The method according toclaim 1 wherein a volume accessible to reactive material flowing throughthe reaction chamber is constrained by a transparent material to lessthan the volume accessible to electromagnetic radiation within thereaction chamber.
 15. The method according to claim 1 wherein thereactive material is entrained in a fluid flow wherein the fluid is aliquid or a gas.
 16. The method according to claim 1 wherein an electricfield is generated in the reaction chamber and said electric fieldenhances absorption of electromagnetic radiation by said reactantmaterials.
 17. The method according to claim 16 wherein the electricfield is operable to orient molecules within reactive materials relativeto the polarization of the EM radiation field at a location in thereaction chamber.
 18. The method according to claim 1 wherein theelectromagnetic radiation is UVC radiation and the reactive material isa microorganism selected from the list of bacteria, virus, protozoan,helminth, yeast, mould or fungus and said UVC radiation inactivates saidmicroorganism.
 19. The method according to claim 1 wherein theelectromagnetic radiation is at least partially collimated to travelprimarily back and forth between the reflective surfaces.
 20. A methodfor applying electromagnetic radiation to reactant materials in areaction chamber comprising: introducing the electromagnetic radiationinto the chamber; and increasing the probability of interaction of theelectromagnetic radiation with the reactant materials by using multiplereflections to increase the optical path length of the electromagneticradiation through the reaction chamber; wherein a source of at leastsome of the electromagnetic radiation is external to the reactionchamber and the electromagnetic radiation from a radiation emitting areaof said source is introduced into the reaction chamber from said sourcethrough an orifice.
 21. The method according to claim 20 wherein theradiation from said emitting area is directed such that substantiallyall passes through the orifice.
 22. The method according to claim 20wherein the orifice is of a smaller area than a body of the source. 23.The method according to claim 20 wherein the orifice comprises anaperture.
 24. The method according to claim 20 wherein the orificecomprises a light pipe carrying light from the source to the chamberwhere the light pipe can be rigid or flexible.
 25. The method accordingto claim 20 wherein the orifice is sized and positioned to reduce anamount of electromagnetic radiation exiting the reaction chamber throughthe orifice and being re-absorbed by the source.
 26. The methodaccording to claim 20 wherein the electromagnetic radiation is at leastpartially collimated to pass through the orifice.
 27. A method forapplying electromagnetic radiation to reactant materials in a reactionchamber comprising: introducing the electromagnetic radiation into thechamber; and increasing the probability of interaction of theelectromagnetic radiation with the reactant materials by using multiplereflections to increase the optical path length of the electromagneticradiation through the reaction chamber; wherein the electromagneticradiation is at least partially collimated.
 28. The method according toclaim 27 wherein the chamber is shaped to define at least one opticalaxis and the at least partially collimated electromagnetic radiation isdirected so as to preferentially propagate along the optical axis. 29.The method according to claim 28 wherein said at least one optical axisincludes at least one change in direction.